通过修改隔离环电压来减小大LDNMOSFET衬底电流

Sue-Yi Chen, Shao-Chang Huang, K. Hsu, Yin-Wei Peng, Jiabin Dong, J. Gan
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引用次数: 0

摘要

在电源管理集成电路中,较大的衬底电流会导致器件熔化。许多研究都集中在如何通过工艺修改来减少衬底电流。本文对衬底电流的基本机理进行了分析。然后,在隔离环上施加器件漏极和器件源端之间的跟踪高压,以减小衬底电流。工程师可以应用这种方法避免设备烧毁,而不需要改变复杂的工艺。
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Reducing Large LDNMOSFET Substrate Currents by Modifying Isolation Ring Voltages
Large substrate currents could induce the device melt in power manager integrated circuit applications. Many researches are focused on how to reduce substrate currents from process modifications. In this paper, the fundamental substrate current mechanism analyses are studied. Then, a tracing-high voltage between the device drain terminal and the device source terminal applied on the isolation ring is proposed for substrate current reductions. Engineers can apply this method for avoiding the device burned-out without the complicated process changes.
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