通过氧化约束的pn二极管注入单量子点的电流

M. Kantner, U. Bandelow, T. Koprucki, J. Schulze, A. Strittmatter, H. Wunsche
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引用次数: 2

摘要

将电流注入到嵌入在具有氧化孔的垂直pn二极管中的单量子点中,是单光子源技术实现的关键。这需要在脉冲激励下对亚微米大小的区域进行有效的电泵浦,以实现对所需量子点载流子数量的控制。我们展示了实验和理论证据,证明载流子在传统p-i-n设计中,在适合单光子发射器的低注入状态下,通过氧化物孔径后会快速横向扩散。通过采用p掺杂到氧化物孔径的替代设计,可以抑制电流扩散,从而增强电流约束和提高注入效率。
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On current injection into single quantum dots through oxide-confined pn-diodes
Current injection into single quantum dots embedded in vertical pn-diodes featuring oxide apertures is essential to the technological realization of single-photon sources. This requires efficient electrical pumping of sub-micron sized regions under pulsed excitation to achieve control of the carrier population of the desired quantum dots. We show experimental and theoretical evidence for a rapid lateral spreading of the carriers after passing the oxide aperture in the conventional p-i-n-design in the low-injection regime suitable for single-photon emitters. By an alternative design employing p-doping up to the oxide aperture the current spreading can be suppressed resulting in an enhanced current confinement and increased injection efficiencies.
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