常通氮化镓高电子迁移率晶体管的谐振栅极驱动器

T. Ishibashi, M. Okamoto, E. Hiraki, Toshihiko Tanaka, T. Hashizume, T. Kachi
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引用次数: 6

摘要

宽带隙半导体,如碳化硅(SiC)和氮化镓(GaN),是下一代功率器件的理想材料。作者最近制造了一种基于氮化镓的高电子迁移率晶体管(HEMT),这是一种常开器件,用于电力电子应用。然而,当GaN HEMT在更高频率下工作时,所构建的栅极驱动电路的功耗增加。对于常通GaN HEMT,迫切需要一种新的低功耗栅极驱动电路。本文提出了一种适用于新型GaN HEMT的新型谐振栅驱动电路。仿真和实验结果验证了所提谐振门驱动电路的有效性和高实用性。
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Resonant gate driver for normally-on GaN high-electron-mobility transistor
Wide bandgap semiconductors, such as silicon carbide (SiC) and gallium nitride (GaN), are promised materials for next-generation power devices. The authors have recently fabricated a GaN-based high-electron-mobility transistor (HEMT), which is a normally-on device, for power electronics application. However, the power consumption in the constructed gate drive circuit increases when the GaN HEMT is used under higher-frequency operation. A new gate drive circuit with lower power consumption for the normally-on GaN HEMT is strongly required. In this paper, a new resonant gate drive circuit, which is most suitable for the newly fabricated GaN HEMT, is proposed. The validity and high practicability of the proposed resonant gate drive circuit are demonstrated by simulation and experimental results.
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