{"title":"基于二值掩模的轮廓线厚度归一化方法","authors":"A. Shauchuk, V. Tsviatkou","doi":"10.1109/AIC-MITCSA.2016.7759921","DOIUrl":null,"url":null,"abstract":"In this paper propose a method of normalization in thickness of the contour lines based on the analysis by mask of the local orientations of fragments. Comparison of the proposed method with known methods of thinning is held. It is shown that the proposed method is superior to the known methods of thinning on speed and quality.","PeriodicalId":315179,"journal":{"name":"2016 Al-Sadeq International Conference on Multidisciplinary in IT and Communication Science and Applications (AIC-MITCSA)","volume":"48 4 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":"{\"title\":\"Method of normalization of the contour line in thickness based on binary masks\",\"authors\":\"A. Shauchuk, V. Tsviatkou\",\"doi\":\"10.1109/AIC-MITCSA.2016.7759921\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper propose a method of normalization in thickness of the contour lines based on the analysis by mask of the local orientations of fragments. Comparison of the proposed method with known methods of thinning is held. It is shown that the proposed method is superior to the known methods of thinning on speed and quality.\",\"PeriodicalId\":315179,\"journal\":{\"name\":\"2016 Al-Sadeq International Conference on Multidisciplinary in IT and Communication Science and Applications (AIC-MITCSA)\",\"volume\":\"48 4 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 Al-Sadeq International Conference on Multidisciplinary in IT and Communication Science and Applications (AIC-MITCSA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/AIC-MITCSA.2016.7759921\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 Al-Sadeq International Conference on Multidisciplinary in IT and Communication Science and Applications (AIC-MITCSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/AIC-MITCSA.2016.7759921","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Method of normalization of the contour line in thickness based on binary masks
In this paper propose a method of normalization in thickness of the contour lines based on the analysis by mask of the local orientations of fragments. Comparison of the proposed method with known methods of thinning is held. It is shown that the proposed method is superior to the known methods of thinning on speed and quality.
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