半导体制造中光刻机的负载平衡

Arthur M. D. Shr, Alan Liu, Peter P. Chen
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引用次数: 10

摘要

提出了一种基于资源调度和执行矩阵(RSEM)的多智能体调度系统(MSS)来解决半导体制造中光刻机之间的负载平衡问题。这个问题是源于专用光刻机的约束。由于自然偏压,这是光刻机械中引入的新挑战之一。然而,以往研究提出的许多半导体制造生产调度策略或建模方法都没有解决负载平衡问题和专用机器约束问题。在本文中,我们详细描述了所提出的MSS方法的设计,包括系统架构、协调策略及其在RSEM上的调度方法。我们还给出了验证该方法的仿真结果
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Load Balancing among Photolithography Machines in Semiconductor Manufacturing
We propose a multiagent scheduling system (MSS) based on a resource schedule and execution matrix (RSEM) to tackle the issue of load balancing among photolithography machines in semiconductor manufacturing. This issue is derived from the dedicated photolithography machine constraint. It is one of the new challenges introduced in photolithography machinery due to natural bias. However, many scheduling policies or modeling methods proposed by previous research for the semiconductor manufacturing production have not addressed the load balancing issue and dedicated machine constraint. In this paper, we describe the design of the proposed MSS approach in detail, including the system architecture, coordination strategy, and its scheduling method on the RSEM. We also present the simulation results that validate the approach
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