高密度CMOS神经探针实现了1600个记录点和32个输出通道的分层寻址方案

A. S. Herbawi, L. Kiessner, O. Paul, P. Ruther
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引用次数: 13

摘要

本文介绍了一种基于cmos的密集排列电极神经探针的设计、制造和表征。在系统中实现了分层寻址方案,该方案允许集成多达1600个记录点(17×17 μm2),这些记录点沿100 μm宽和10 mm长的探针轴排列在50块中,每个块有32个电极。每个块内的电极垂直和水平间距为20 μm,电极到电极的间距为3 μm。单个记录站点以及2×2相邻电极的组合形成一个几乎更大的记录站点的降低阻抗可以通过32个并行模拟输出通道读出。该系统采用0.18 μm CMOS工艺设计和制造,随后采用内部后CMOS工艺实现电极金属化并定义探针几何形状。通过激活沿轴的单个块并将记录位置切换到特定输出通道,验证了电极选择的系统功能。电极阻抗特性显示,单个Pt电极和2×2电极组合在1 kHz时的绝对值分别为2.2±0.3 MΩ和550±50 kΩ。
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High-density CMOS neural probe implementing a hierarchical addressing scheme for 1600 recording sites and 32 output channels
This paper presents the design, fabrication and characterization of CMOS-based neural probes with a densely-packed electrode array. A hierarchical addressing scheme is implemented in the system which allows to integrate up to 1600 recording sites (17×17 μm2) arranged in 50 blocks of 32 electrodes each along a 100-μm-wide and 10-mm-long probe shaft. The electrodes within each block have a vertical and horizontal pitch of 20 μm resulting in an electrode-to-electrode separation of 3 μm. Single recording sites as well as combinations of 2×2 adjacent electrodes forming a virtually larger recording site of reduced impedance can be read out via 32 parallel analog output channels. The system was designed and fabricated in a 0.18 μm CMOS technology followed by an in-house post-CMOS process used to realize the electrode metallization and define the probe geometry. System functionality for electrode selection was verified by activating individual blocks along the shaft and switching recording sites to specific output channels. Impedance characterization of the electrodes revealed absolute values of 2.2±0.3 MΩ and 550±50 kΩ at 1 kHz for individual Pt electrodes and 2×2 electrode combinations, respectively.
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