利用荧光成像技术评价光合作用对除草剂、高温和高照度的耐受性

P. Saura, M. J. Quiles
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引用次数: 13

摘要

荧光成像是揭示和理解由外部因素(如非生物胁迫)引起的叶片性能空间异质性的一种非侵入性工具。以日光植物(Rosa meillandina)和菊花(Chrysanthemum morifo- lium)和遮荫植物(Spathiphyllum wallisii)为研究对象,研究了它们对高温和高照度的耐受性。利用荧光成像技术分析了植物附着叶片的荧光产率、有效PSII量子产率和非光化学猝灭。所有物种的对照植物在整个叶片上都显示出均匀的荧光参数图像。荧光产率(F)小于等于0.1,有效PSII量子产率(Y(II))在0.75左右,非光化学猝灭(NPQ)小于0.3。这两种日光植物对逆境条件表现出更高的耐受性。应力光周期后,F和Y(II)图像变化不大,部分叶片区域的NPQ增加,说明这些区域的热能耗散比其他区域多。在无胁迫条件下,一个恢复光周期后的荧光参数图像与对照相似。遮荫植物在第一个光周期后表现出较低的耐受性和不可逆损伤,特别是在叶基部和邻近肋部。叶片中部和顶部损伤较小,有效PSII量子产率较高,因为叶片弯曲以减少入射辐射。与除草剂DCMU和百草枯孵育导致荧光参数图像的差异。DCMU (0.1 mM)的效果在30分钟后可见,从叶片的肋骨和邻近区域开始。3种植物对百草枯(0.2 mM)的敏感性不同,孵育时间不同对有效量子产率也有影响。
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Assessment of Photosynthesis Tolerance to Herbicides, Heat and High Illumination by Fluorescence Imaging
Fluorescence imaging represents a non-invasive tool for revealing and understanding spatial heterogeneity in leaf performance caused by external factors, such as abiotic stress. Sun (Rosa meillandina and Chrysanthemum morifo- lium) and shade (Spathiphyllum wallisii) plants were used to study their tolerance to heat and high illumination. Fluores- cence yield, effective PSII quantum yield and non-photochemical quenching were analysed in leaves attached to plants by fluorescence imaging. The control plants of all species showed homogeneous images of the fluorescence parameters throughout the leaf. The fluorescence yield (F) was 0.1 or less, the effective PSII quantum yield (Y(II)) around 0.75 and non-photochemical quenching (NPQ) less than 0.3. The two sun plants showed higher tolerance to stress conditions. Few variations were observed in F and Y(II) images after stress photoperiods and some leaf regions showed an increase in NPQ, indicating more thermal energy dissipation in these zones than in other leaf regions. The images of the fluorescence parameters were similar to those of control plants after one recovery photoperiod without stress conditions. Shade plant showed lower tolerance and irreversible damage was observed after the first photoperiod, particularly at the base of the leaf and in the areas adjacent to the ribs. The centre and top of the leaf were less damaged, and effective PSII quantum yield remained high because the leaf curved to reduce the incident radiation. Incubation with the herbicides DCMU and paraquat led to differences in the fluorescence parameter images. The effect of DCMU (0.1 mM) was visible after 30 min incubation, beginning at the ribs and adjacent areas of the leaf. The three species studied showed different degree of sensi- tivity to paraquat (0.2 mM), and the effective quantum yield in each species was affected at different incubation times.
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