缝形CuCr电极真空击穿场特性及场增强因子β的比较

Kazuki Sato, Y. Yamano, N. Asari, T. Shioiri, Takayoshi Icikawa
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引用次数: 3

摘要

真空灭流器(VI)的接触电极在电极表面具有狭缝部分,用于控制电流中断时的真空电弧。狭缝的边缘结构对高电压应用的性能至关重要。本文研究了狭缝结构曲率半径对CuCr合金狭缝电极的场增强因子β和真空击穿特性的影响。结果表明,狭缝边缘的圆形倒角结构由于减少了预击穿电流的流动,即较小的场发射电流,从而增加了击穿场。这是由于小β值的圆倒角的边缘在狭缝。当狭缝电极的狭缝末端曲率半径大于1 mm时,狭缝电极的双相场可以得到改善,而R0.5狭缝电极的曲率半径为0.5 mm时,由于狭缝边缘曲率不充分,对双相场的改善效果几乎为零。
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Characteristics of vacuum breakdown field and comparison of field enhancement factor β in CuCr electrodes with slit configuration
A contact electrode of vacuum interrupter (VI) has slit parts on the electrode surface to control the vacuum arc during the current interruption. The edge configuration of the slit is important for the withstand performance of high voltage application for VI. We investigated the effect of the curvature radius of slit's configuration on the field enhancement factor β and the characteristics of vacuum breakdown for the slit electrodes made of CuCr alloy simplified simulating the AMF-electrode. As the results, the round chamfered configuration at the edge of slit increases the breakdown field, because of the reduction of pre-breakdown current flowing, that is, small field emission current. This is due to be small β-value by rounding chamfering of the edge at the slit. The BD field of the slit electrode can be improved by rounding the edge of the end of the slit more than 1 mm curvature radius, and the curvature of 0.5 mm radius for R0.5 slit electrode had almost little effect on improving the BD field owing to manufacturing inadequate curvature at the edge of slit.
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