用于LWIR探测器工艺优化的ii型In(Ga)Sb量子点结构表面态表征与模拟

Qin Wang, M. Rajabi, A. Karim, S. Almqvist, M. Bakowski, S. Savage, J. Andersson, M. Göthelid, Shun Yu, O. Gustafsson, M. Hammar, C. Asplund
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引用次数: 0

摘要

基于嵌入InAs矩阵的ii型In(Ga)Sb量子点(QDs)的量子结构被用作实现长波红外(LWIR)光电探测器的活性材料。InAs和In(Ga)Sb都是窄带半导体材料,已知具有大量表面态,这显然对探测器的电学和光学性能产生重大影响。这些表面状态不仅由材料或器件加工引起的缺陷引起,而且还由表面悬垂键、氧化物、粗糙度和污染物引起。通过原子力显微镜(AFM)、扫描电子显微镜(SEM)、能量色散x射线能谱(EDX)和x射线光电子能谱(XPS)测量,实验分析了不同器件制备步骤处理后的QD结构的表面态。研究结果被用来优化我们正在进行的项目中LWIR光电探测器的制作工艺。在10 ~ 300 K的温度范围内,对制备的红外探测器的暗电流及其温度依赖性进行了表征,并利用仿真工具MEDICI建立了理论模型,对实验结果进行了分析。
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Surface states characterization and simulation of Type-II In(Ga)Sb quantum dot structures for processing optimization of LWIR detectors
Quantum structures base on type-II In(Ga)Sb quantum dots (QDs) embedded in an InAs matrix were used as active material for achieving long-wavelength infrared (LWIR) photodetectors in this work. Both InAs and In(Ga)Sb are narrow band semiconductor materials and known to possess a large number of surface states, which apparently play significant impact for the detector’s electrical and optical performance. These surface states are caused not only by material or device processing induced defects but also by surface dangling bonds, oxides, roughness and contaminants. To experimentally analyze the surface states of the QD structures treated by different device fabrication steps, atomic force microscopy (AFM), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX) and X-ray photoelectron spectroscopy (XPS) measurements were performed. The results were used to optimize the fabrication process of the LWIR photodetectors in our ongoing project. The dark current and its temperature dependence of the fabricated IR photodetectors were characterized in temperature range 10 K to 300 K, and the experiment results were analyzed by a theoretic modeling obtained using simulation tool MEDICI.
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