Tb-Fe薄膜耐蚀性能的改进

Masanobu Kobayashi, Y. Maeno, K. Oishi, K. Kawamura
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引用次数: 5

摘要

非晶稀土过渡金属薄膜(RE-TM薄膜)具有适合于可擦除光存储介质的性能。它们已经得到了广泛的研究,并将很快进入实际应用的阶段。然而,由于这些薄膜的耐腐蚀性较差,因此具有可靠性差的缺点。我们报道了薄膜的腐蚀分为表面氧化、稀土金属的选择性氧化和电化学腐蚀。1,2为了保护RE-TM膜不受腐蚀,可以考虑两种方法。一种方法是提高薄膜本身的耐腐蚀性。另一种是在RE-TM薄膜表面涂上SiO、ain等保护层。3我们研究了RE-TM薄膜在NaCl水溶液中的电化学腐蚀,通过添加几种金属元素,成功地提高了薄膜本身的耐蚀性。
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Improvements in Corrosion Resistance of Tb-Fe Thin Films
Amorphous rare earth-transition metal thin films (RE-TM films) have properties suited for erasable optical memory media. They have been widely studied and will be soon in a step of practical use. These films, however, have the drawback of poor reliability due to their poor corrosion resistance. We have reported that the corrosion of the films is classified as being the surface oxidation, the selective oxidation of RE metals, and electrochemical corrosion.1,2 To protect the RE-TM films from the corrosion, two methods can be considered. One method is to improve the corrosion resistance of the films themselves. The other is to coat the films with protective layers such as SiO, AIN.3 We have studied the electrochemical corrosion of RE–TM films immersed in a NaCl aqueous solution and succeeded in improving the corrosion resistance of the films themselves by adding several metals.
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