天然表面粗糙度对电场作用下金属电子发射的影响

V. Choulkov
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引用次数: 2

摘要

对于理想的金属表面,在比理论上预期的小几百倍的场处存在电子发射,可以用从阴极表面突出的尖锐金属点处局部场增强引起的发射增加来解释。本文提出了原子尺寸(10-8-10-7 cm)金属表面晶面自然粗糙度影响异常场发射的新机制。结果表明,在晶格的几个周期大小的自然粗糙度导致发射点的产生,其功函数明显小于完全光滑表面上的薄功函数。采用具有肖特基校正的理查德森-达什曼热场发射理论计算了各点的电流密度。考虑了晶体表面自然粗糙度引起的电场变化。根据发射点对发射电流进行了估计。然后利用统计理论计算金属表面的发射点密度。总发射电流确定为金属表面上发射点分布的电流平均值。结果表明,在105 ~ 106v /cm表面平均电场强度下,这些位置的热场电子发射在总发射中起着最重要的作用。
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Effect of natural surface roughness on electron emission from metal in electric field
The existence of electron emission at fields some hundreds of times smaller than expected theoretically for an ideal metal surface one explains by emission increase due to local field enhancement at the sharp metallic point protruding from cathode surface. This paper offers a new mechanism explaining anomalous field emission by effect of natural rughness of crystal face of metal surface with atomic sizes (10-8-10-7 cm). It is shown that natural roughness with size about a few period of crystal lattice leads to production of emission sites where work function is significantly less thin work function at a perfectly smooth surface. The Richardson- Dashman thermo-field emission theory with Schottky correction is used for the calculations of current density at the sites. The electrical field change is evoked by natural roughness of crystal face is taken into account. An estimate of emission current in term of emission sites is performed. Then density of emission Sites on metal surface is computed by using the Statistical theory. Total emission current is determined as current averaged over emission sites distribution on metal surface. It is shown that the thermo-field electron emission from such sites play most important role in total emission at average electric field strength on surface 105-106V/cm.
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