磁光记录的抗反射结构

A. Bell
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引用次数: 0

摘要

抗反射薄膜结构(1)已被有利地用于一次性写入(2)(3)和可逆相变(4)材料设计,以提供更高的灵敏度,更好的标记对比度和放大小激光诱导标记效果的光学效应。同样的结构可用于磁光记录,以增加克尔读出的性能R½ΘK的短噪声限制系数。以前的报告分析了单四分之一波覆盖层(5)和更强大的方法,如封装的三层(四层)(6)的影响。本文将全面分析各种抗反射结构的方法及其对微噪声限制磁光读出的相对增强能力。
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Antireflection Structures for Magneto-Optic Recording
Antireflective thin film structures(1) have been used advantageously in write – once(2)(3) and reversible phase change(4) materials design to provide increased sensitivity, better marking contrast and to amplify the optical effects of small laser-induced marking effects. The same structures may be used in magneto-optic recording to increase the shot-noise-limited figure of merit R½ΘK for Kerr readout. Previous reports have analyzed the effects of single quarter-wave overlayers(5) and more powerful approaches such as the encapsulated trilayer (quadrilayer)(6). This paper will present a comprehensive analysis of the various approaches to antireflection structures and their relative enhancement capabilities for shot noise limited magneto-optic readout.
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