基于威布尔分布函数的片上VLSI互连延迟估计

R. Kar, A. Chattaraj, A. Chandra, A. K. Mal, A. Bhattacharjee
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引用次数: 4

摘要

在深亚微米(DSM)系统中,片上互连延迟明显比栅极延迟更重要。为了准确有效地捕获互连延迟,提出了几种方法。通过将线性电路的脉冲响应解释为概率分布函数(PDF), Elmore首先估计了互连延迟。目前已经报道了PRIMO、AWE、h-Gamma、WED、D2M等其他几种方法,与Elmore延迟度量相比,这些方法被证明是更准确的延迟估计。但在整个集成电路设计过程中使用时,它们的计算复杂性较大。我们的工作给出了互连延迟的封闭形式公式。延迟度量是通过将电路矩与威布尔分布匹配得到的。通过使用单个查找表,可以很容易地实现步进和斜坡输入的延迟度量。通过实际工业设计,实验验证了该时延度量方法的有效性。
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Delay Estimation for On-Chip VLSI Interconnect using Weibull Distribution Function
In deep sub-micrometer (DSM) regime the on-chip interconnect delay is significantly more dominating than the gate delay. Several approaches have been proposed to capture the interconnect delay accurately and efficiently. By interpreting the impulse response of a linear circuit as a probability distribution function (PDF), Elmore first estimated the interconnect delay. Several other approaches like PRIMO, AWE, h-Gamma, WED, D2M etc. have been reported so far, which are shown to be more accurate delay estimation compared to Elmore delay metric. But they suffer from computational complexity when using in the total IC design processes. Our work presents a closed form formula for interconnect delay. The delay metric is derived by matching circuit moments to the Weibull distribution. The delay metric can be easily implemented for both step and ramp inputs by using a single look-up table. Experiments validate the effectiveness of the delay metric for nets from a real industrial design.
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