锌络合剂在化学浴法制备ZnO和ZnS薄膜中的作用

Johan Andrés Vargas Rueda, A. Alonso, M. Meléndez-Lira
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引用次数: 0

摘要

为了控制化学镀液沉积锌相关膜,分析了锌络合剂对化学镀液沉积锌相关膜的影响。以柠檬酸钠、乙醇胺和三乙醇胺为络合剂,采用化学浴沉积法制备了ZnS薄膜。利用锌配合物摩尔分数分布图,通过热力学分析得到了ZnS (ZnO)薄膜的沉积条件。从锌-乙醇胺,锌-三乙醇胺和锌-柠檬酸盐的种分布图。结果表明,当pH值在4 ~ 6之间时,锌含量最高。结果表明,配合剂形态的重要性,而乙醇胺和三乙醇胺由于其高反应活性而制备ZnO薄膜;利用柠檬酸钠制备ZnS薄膜。沉积的ZnS薄膜具有立方结构,n型电导率,电阻率为8.36×104 ??cm,带隙3.75 eV。
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The role of Zn-complexing agents in the chemical bath deposition of ZnO and ZnS thin films
In order to control the deposition of Zn-related films by chemical bath deposition, the effects of Zn-complexing agent are analyzed. ZnS films were produced by chemical bath deposition technique employing sodium citrate, ethanolamine and Triethanolamine as complexing agents. The deposition conditions for ZnS (ZnO) thin films were obtained through a thermodynamic analysis, using distribution diagrams for molar fraction of Zn complexes. From species distribution diagrams of Zn-ethanolamine, Zn-Triethanolamine and Zn-citrate. It was found that for pH values between 4 and 6 the highest Zn fraction is obtained. The results highlight the importance of complexing agent morphology, while the use of ethanolamine and triethanolamine produce ZnO films due to their high reactivity; the use of sodium citrate produce ZnS films. Deposited ZnS films have a cubic structure, n-type conductivity, resistivity of 8.36×104 ??cm with a 3.75 eV bandgap.
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