溶胶-凝胶自旋镀膜技术增加TiO2掺杂氯化铌(NbCl5)的晶粒尺寸

M. Sarah, N. Azman, S. S. Shariffudin, H. Hashim
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摘要

在这项工作中,我们成功地制备了掺杂不同浓度NbCl5的TiO2薄膜。掺杂浓度分别为0.0 mol%、0.1 mol%、0.2 mol%、0.3 mol%和0.4 mol%。通过电学性能和表面形貌进行表征。结果表明,随着NbCl5浓度的增加,电流逐渐增大。在表面形貌上,TiO2薄膜的晶粒尺寸随着掺杂浓度的增加而增大。结果表明,随着NbCl5掺杂浓度的变化,合金的I-V特性随晶粒尺寸的变化而变化。本研究优化的薄膜中NbCl5的含量为0.4 mol%。
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Increment on Grain Size of TiO2 doped niobium chloride (NbCl5) by sol-gel spin coating technique
In this work, we have successfully prepared TiO2 thin films doped with various concentration of NbCl5. The doping concentrations were varied from 0.0 mol%, 0.1 mol%, 0.2 mol%, 0.3 mol% and 0.4 mol%. The characterizations were done by means of electrical properties and surface morphology. The results show that as the concentrations of NbCl5 increased, current escalates. For surface morphology, the grain size of TiO2 thin films becomes larger when doping concentrations were increased. It shows that the I-V characteristic depends on the grain size as the doping concentration of NbCl5 varies. The optimized thin film in this work is 0.4 mol% of NbCl5.
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