{"title":"溶胶-凝胶自旋镀膜技术增加TiO2掺杂氯化铌(NbCl5)的晶粒尺寸","authors":"M. Sarah, N. Azman, S. S. Shariffudin, H. Hashim","doi":"10.1109/SMELEC.2016.7573625","DOIUrl":null,"url":null,"abstract":"In this work, we have successfully prepared TiO2 thin films doped with various concentration of NbCl5. The doping concentrations were varied from 0.0 mol%, 0.1 mol%, 0.2 mol%, 0.3 mol% and 0.4 mol%. The characterizations were done by means of electrical properties and surface morphology. The results show that as the concentrations of NbCl5 increased, current escalates. For surface morphology, the grain size of TiO2 thin films becomes larger when doping concentrations were increased. It shows that the I-V characteristic depends on the grain size as the doping concentration of NbCl5 varies. The optimized thin film in this work is 0.4 mol% of NbCl5.","PeriodicalId":169983,"journal":{"name":"2016 IEEE International Conference on Semiconductor Electronics (ICSE)","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Increment on Grain Size of TiO2 doped niobium chloride (NbCl5) by sol-gel spin coating technique\",\"authors\":\"M. Sarah, N. Azman, S. S. Shariffudin, H. Hashim\",\"doi\":\"10.1109/SMELEC.2016.7573625\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, we have successfully prepared TiO2 thin films doped with various concentration of NbCl5. The doping concentrations were varied from 0.0 mol%, 0.1 mol%, 0.2 mol%, 0.3 mol% and 0.4 mol%. The characterizations were done by means of electrical properties and surface morphology. The results show that as the concentrations of NbCl5 increased, current escalates. For surface morphology, the grain size of TiO2 thin films becomes larger when doping concentrations were increased. It shows that the I-V characteristic depends on the grain size as the doping concentration of NbCl5 varies. The optimized thin film in this work is 0.4 mol% of NbCl5.\",\"PeriodicalId\":169983,\"journal\":{\"name\":\"2016 IEEE International Conference on Semiconductor Electronics (ICSE)\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-08-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 IEEE International Conference on Semiconductor Electronics (ICSE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMELEC.2016.7573625\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 IEEE International Conference on Semiconductor Electronics (ICSE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMELEC.2016.7573625","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Increment on Grain Size of TiO2 doped niobium chloride (NbCl5) by sol-gel spin coating technique
In this work, we have successfully prepared TiO2 thin films doped with various concentration of NbCl5. The doping concentrations were varied from 0.0 mol%, 0.1 mol%, 0.2 mol%, 0.3 mol% and 0.4 mol%. The characterizations were done by means of electrical properties and surface morphology. The results show that as the concentrations of NbCl5 increased, current escalates. For surface morphology, the grain size of TiO2 thin films becomes larger when doping concentrations were increased. It shows that the I-V characteristic depends on the grain size as the doping concentration of NbCl5 varies. The optimized thin film in this work is 0.4 mol% of NbCl5.