三维聚合物微光学无接触抛光VUV曝光后垂直材料对比度的深度轮廓

R. Kirchner, Roel Hoekstra, N. Chidambaram, H. Schift
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引用次数: 2

摘要

研究了172 nm的高能真空紫外光子对聚甲基丙烯酸甲酯的分子量和玻璃化转变温度的影响。我们发现,暴露样品表面的分子量随着向位于修饰区域下方的未暴露体材料的连续过渡而强烈减少。与本体区122℃相比,暴露区玻璃化转变温度显著降低至远低于50℃。我们可以使用这种材料对比有选择地回流暴露样品的顶部表面。这使我们能够通过后处理创建超光滑的微光学结构,而不会影响光学功能所需的整体几何形状。
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Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics
We characterize the impact of high-energy, 172 nm vacuum ultraviolet photons on the molecular weight and the glass transition temperature of poly(methyl methacrylate). We found that the molecular weight is reduced strongly on the surface of the exposed samples with a continuous transition towards the unexposed bulk material being located below the modified region. The glass transition temperature was found to be significantly lowered in the exposed region to well below 50°C compared to that of the 122°C of the bulk region. We could use this material contrast to selectively reflow the top surface of the exposed samples only. This allowed us to create ultra-smooth micro-optical structures by post-processing without influencing the overall geometry that is required for the optical functionality.
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