{"title":"用于EUV光刻基础设施的光子超晶格多层","authors":"F. Kuchar, R. Meisels","doi":"10.1117/12.2322410","DOIUrl":null,"url":null,"abstract":"A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.","PeriodicalId":287066,"journal":{"name":"European Mask and Lithography Conference","volume":"46 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2018-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Photonic superlattice multilayers for EUV lithography infrastructure\",\"authors\":\"F. Kuchar, R. Meisels\",\"doi\":\"10.1117/12.2322410\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.\",\"PeriodicalId\":287066,\"journal\":{\"name\":\"European Mask and Lithography Conference\",\"volume\":\"46 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2018-09-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"European Mask and Lithography Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2322410\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"European Mask and Lithography Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2322410","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Photonic superlattice multilayers for EUV lithography infrastructure
A numerical study of EUV Bragg mirrors with superstructures is presented. These modifications of the standard Mo/Si mirror are periodic superlattices as well as depth grading of the superlattice multilayers. The main results concern a narrowing of the normal incidence peak and all-angle reflection at 13.5 nm. Best results are obtained with a combination of superlattices with 4 and 5 superperiods and depth grading. The effect of the spectral width of the EUV source is also taken into account.
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