基于物理的功率SiC肖特基二极管模型的参数提取程序

Ruiyun Fu, A. Grekov, Kang Peng, E. Santi
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引用次数: 27

摘要

给出了一个简单的基于物理的功率SiC肖特基二极管模型的详细参数提取过程。所开发的程序包括提取功率肖特基二极管模型所需的掺杂浓度、有源面积和漂移区厚度。主要优点是开发的程序不需要器件制造的任何知识,这通常是电路设计师无法获得的。参数提取所需的唯一测量是简单的静态I-V表征和C-V测量。此外,基于物理的SiC肖特基二极管模型的参数提取过程包含温度依赖性,普遍适用于SiC肖特基二极管。该程序演示了来自两个不同制造商的四个肖特基二极管,具有以下额定值:600V/50A, 1.2kV/3A, 1.2kV/7A和1.2kV/20A。
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Parameter extraction procedure for a physics-based power SiC Schottky diode model
A detailed parameter extraction procedure for a simple physics-based power SiC Schottky diode model is presented. The developed procedure includes the extraction of doping concentration, active area and thickness of drift region, which are needed in the power Schottky diode model. The main advantage is that the developed procedure does not require any knowledge of device fabrication, which is usually not available to circuit designers. The only measurements required for the parameter extraction are a simple static I-V characterization and C-V measurements. Furthermore, the physics-based SiC Schottky diode model whose parameters are extracted by the proposed procedure includes temperature dependencies and is generally applicable to SiC Schottky diodes. The procedure is demonstrated for four Schottky diodes from two different manufacturers having the following ratings: 600V/50A, 1.2kV/3A, 1.2kV/7A, and 1.2kV/20A.
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