干涉光刻技术在光子晶体集成波导器件中的平行制造

2005 OSA Topical Meeting on Information Photonics (IP) Pub Date : 2005-06-06 DOI:10.1364/AOPT.2005.JWB10

A. Chincholi, S. Banerjee, J.S. Huang, D. Klotzkin

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引用次数: 1

摘要

多次曝光干涉光刻是一种很有前途的制造光子晶体区域的方法，光刻映射的光子晶体区域易于与传统波导或光学器件集成。报道了方形pc的初步制备结果。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices

Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.

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2005 OSA Topical Meeting on Information Photonics (IP)

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