用于教育和原型设计的混合开源和专有EDA共享:邀请论文

A. Kahng
{"title":"用于教育和原型设计的混合开源和专有EDA共享:邀请论文","authors":"A. Kahng","doi":"10.1145/3508352.3561378","DOIUrl":null,"url":null,"abstract":"In recent years, several open-source projects have shown potential to serve a future technology commons for EDA and design prototyping. This paper examines how open-source and proprietary EDA technologies will inevitably take on complementary roles within a future technology commons. Proprietary EDA technologies offer numerous benefits that will endure, including (i) exceptional technology and engineering; (ii) ever-increasing importance in design-based equivalent scaling and the overall semiconductor value chain; and (iii) well-established commercial and partner relationships. On the other hand, proprietary EDA technologies face challenges that will also endure, including (i) inability to pursue directions such as massive leverage of cloud compute, extreme reduction of turnaround times, or \"free tools\"; and (ii) difficulty in evolving and addressing new applications and markets. By contrast, open-source EDA technologies offer benefits that include (i) the capability to serve as a friction-free, democratized platform for education and future workforce development (i.e., as a platform for EDA research, and as a means of teaching / training both designers and EDA developers with public code); and (ii) addressing the needs of underserved, non-enterprise account markets (e.g., older nodes, research flows, cost-sensitive IoT, new devices and integrations, system-design-technology pathfinding). This said, open-source will always face challenges such as sustainability, governance, and how to achieve critical mass and critical quality. The paper will conclude with key directions and synergies for open-source and proprietary EDA within an EDA Commons for education and prototyping.","PeriodicalId":270592,"journal":{"name":"2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD)","volume":"14 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A Mixed Open-Source and Proprietary EDA Commons for Education and Prototyping : Invited Paper\",\"authors\":\"A. Kahng\",\"doi\":\"10.1145/3508352.3561378\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In recent years, several open-source projects have shown potential to serve a future technology commons for EDA and design prototyping. This paper examines how open-source and proprietary EDA technologies will inevitably take on complementary roles within a future technology commons. Proprietary EDA technologies offer numerous benefits that will endure, including (i) exceptional technology and engineering; (ii) ever-increasing importance in design-based equivalent scaling and the overall semiconductor value chain; and (iii) well-established commercial and partner relationships. On the other hand, proprietary EDA technologies face challenges that will also endure, including (i) inability to pursue directions such as massive leverage of cloud compute, extreme reduction of turnaround times, or \\\"free tools\\\"; and (ii) difficulty in evolving and addressing new applications and markets. By contrast, open-source EDA technologies offer benefits that include (i) the capability to serve as a friction-free, democratized platform for education and future workforce development (i.e., as a platform for EDA research, and as a means of teaching / training both designers and EDA developers with public code); and (ii) addressing the needs of underserved, non-enterprise account markets (e.g., older nodes, research flows, cost-sensitive IoT, new devices and integrations, system-design-technology pathfinding). This said, open-source will always face challenges such as sustainability, governance, and how to achieve critical mass and critical quality. The paper will conclude with key directions and synergies for open-source and proprietary EDA within an EDA Commons for education and prototyping.\",\"PeriodicalId\":270592,\"journal\":{\"name\":\"2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD)\",\"volume\":\"14 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-10-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1145/3508352.3561378\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 IEEE/ACM International Conference On Computer Aided Design (ICCAD)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1145/3508352.3561378","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

近年来,一些开源项目已经显示出为EDA和设计原型提供未来技术共享的潜力。本文探讨了开源和专有EDA技术如何在未来的技术共享中不可避免地发挥互补作用。专有的EDA技术提供了许多将持续存在的优势,包括(i)卓越的技术和工程;(ii)在基于设计的等效缩放和整个半导体价值链中的重要性日益增加;(iii)建立良好的商业和合作伙伴关系。另一方面,专有EDA技术面临的挑战也将持续存在,包括(i)无法追求诸如大规模利用云计算、极度缩短周转时间或“免费工具”等方向;(ii)发展和应对新应用和新市场的困难。相比之下,开源EDA技术提供的好处包括:(i)作为教育和未来劳动力发展的无障碍、民主化平台的能力(即,作为EDA研究的平台,以及作为使用公共代码教学/培训设计人员和EDA开发人员的手段);(ii)满足服务不足的非企业客户市场的需求(例如,旧节点、研究流程、成本敏感的物联网、新设备和集成、系统设计技术寻路)。也就是说,开源将始终面临诸如可持续性、治理以及如何达到临界质量等挑战。本文将总结为教育和原型设计的EDA共享中的开源和专有EDA的关键方向和协同作用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
A Mixed Open-Source and Proprietary EDA Commons for Education and Prototyping : Invited Paper
In recent years, several open-source projects have shown potential to serve a future technology commons for EDA and design prototyping. This paper examines how open-source and proprietary EDA technologies will inevitably take on complementary roles within a future technology commons. Proprietary EDA technologies offer numerous benefits that will endure, including (i) exceptional technology and engineering; (ii) ever-increasing importance in design-based equivalent scaling and the overall semiconductor value chain; and (iii) well-established commercial and partner relationships. On the other hand, proprietary EDA technologies face challenges that will also endure, including (i) inability to pursue directions such as massive leverage of cloud compute, extreme reduction of turnaround times, or "free tools"; and (ii) difficulty in evolving and addressing new applications and markets. By contrast, open-source EDA technologies offer benefits that include (i) the capability to serve as a friction-free, democratized platform for education and future workforce development (i.e., as a platform for EDA research, and as a means of teaching / training both designers and EDA developers with public code); and (ii) addressing the needs of underserved, non-enterprise account markets (e.g., older nodes, research flows, cost-sensitive IoT, new devices and integrations, system-design-technology pathfinding). This said, open-source will always face challenges such as sustainability, governance, and how to achieve critical mass and critical quality. The paper will conclude with key directions and synergies for open-source and proprietary EDA within an EDA Commons for education and prototyping.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Squeezing Accumulators in Binary Neural Networks for Extremely Resource-Constrained Applications Numerically-Stable and Highly-Scalable Parallel LU Factorization for Circuit Simulation Towards High Performance and Accurate BNN Inference on FPGA with Structured Fine-grained Pruning RT-NeRF: Real-Time On-Device Neural Radiance Fields Towards Immersive AR/VR Rendering Design and Technology Co-optimization Utilizing Multi-bit Flip-flop Cells
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1