{"title":"安装在磁隔离传输线上的等离子体开关按负载分流z -箝位","authors":"V. Kokshenev","doi":"10.1109/EFRE47760.2020.9241936","DOIUrl":null,"url":null,"abstract":"A planar plasma source based on a high-current discharge in a dielectric capillary has been created, which allows the formation of high-speed plasma flows with a density of at least 10−7g/cm3. Using a metal plasma duct, a uniform planar flow was obtained, having a speed of $9\\ \\text{cm}/ \\mu\\mathrm{s}$ and an angle of opening of the plasma jet of ∼ 20°. A switch based on the created planar plasma source made it possible to implement a controlled mode of shunting the inductive load with a mega-ampere current from the discharge circuit of the primary energy storage device.","PeriodicalId":190249,"journal":{"name":"2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)","volume":"23 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Shunting Z-Pinch by Load by Plasma Switch Installed in a Magnetically Isolated Transmission Line\",\"authors\":\"V. Kokshenev\",\"doi\":\"10.1109/EFRE47760.2020.9241936\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A planar plasma source based on a high-current discharge in a dielectric capillary has been created, which allows the formation of high-speed plasma flows with a density of at least 10−7g/cm3. Using a metal plasma duct, a uniform planar flow was obtained, having a speed of $9\\\\ \\\\text{cm}/ \\\\mu\\\\mathrm{s}$ and an angle of opening of the plasma jet of ∼ 20°. A switch based on the created planar plasma source made it possible to implement a controlled mode of shunting the inductive load with a mega-ampere current from the discharge circuit of the primary energy storage device.\",\"PeriodicalId\":190249,\"journal\":{\"name\":\"2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)\",\"volume\":\"23 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-09-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EFRE47760.2020.9241936\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 7th International Congress on Energy Fluxes and Radiation Effects (EFRE)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EFRE47760.2020.9241936","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Shunting Z-Pinch by Load by Plasma Switch Installed in a Magnetically Isolated Transmission Line
A planar plasma source based on a high-current discharge in a dielectric capillary has been created, which allows the formation of high-speed plasma flows with a density of at least 10−7g/cm3. Using a metal plasma duct, a uniform planar flow was obtained, having a speed of $9\ \text{cm}/ \mu\mathrm{s}$ and an angle of opening of the plasma jet of ∼ 20°. A switch based on the created planar plasma source made it possible to implement a controlled mode of shunting the inductive load with a mega-ampere current from the discharge circuit of the primary energy storage device.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
