A. Suarez, M. Prelas, T. Ghosh, R. Tompson, S. Loyalka, W. Miller, D. Viswanath
{"title":"用电场增强扩散(EFED)技术研究硼在多晶金刚石薄膜中的扩散","authors":"A. Suarez, M. Prelas, T. Ghosh, R. Tompson, S. Loyalka, W. Miller, D. Viswanath","doi":"10.1177/1524511X02010001002","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":246239,"journal":{"name":"Journal of Wide Bandgap Materials","volume":"32 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2002-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"16","resultStr":"{\"title\":\"Diffusion of Boron into Polycrystalline Diamond Films Using the Electric Field Enhanced Diffusion (EFED) Technique\",\"authors\":\"A. Suarez, M. Prelas, T. Ghosh, R. Tompson, S. Loyalka, W. Miller, D. Viswanath\",\"doi\":\"10.1177/1524511X02010001002\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":246239,\"journal\":{\"name\":\"Journal of Wide Bandgap Materials\",\"volume\":\"32 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2002-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"16\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Wide Bandgap Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1177/1524511X02010001002\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Wide Bandgap Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1177/1524511X02010001002","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}