Improved SOI-MESFET structures for enhanced efficiency and optimized DC/RF characteristics

ABSTRACTIn this paper, two new silicon on insulator metal-semiconductor field effect transistor (SOI-MESFET) structures are presented. Two parallel layers of oxide and aluminium are added at the gate edge of these structures. Also, in the buried oxide part of the Aluminium Edge and Silicon-Well MESFET (AESW-MESFET) structure, a silicon well and two aluminium layers are added. Moreover, and to improve the DC and RF characteristics, as compared to the Conventional MESFET (C-MESFET) structure, a silicon well and a silicon layer are added in the box oxide section in the Silicon Edge and Silicon-Well MESFET (SESW-MESFET) structure. By these changes, the value of the breakdown voltage in the normal structure has increased from 15.8 V to 33.1 V and 30.9 V in the proposed AESW-MESFET and SESW-MESFET structures, respectively. In addition, the maximum output power has been associated with a significant increase of 4.44 and 5.24 times, respectively. Compared to the C-MESFET, the proposed structures reduce gate-source and gate-drain capacitors and significantly increases conductivity. The cut-off frequency values are increased from 19.3 GHz (the normal structure) to 37.3 GHz and 35 GHz (the proposed structures), and the maximum oscillation frequencies are increased from 80 GHz to 154 GHz and 102.3 GHz. Therefore, the results show that the proposed structures have good performance and the ability to work at high power and high frequency.KEYWORDS: SOI-MESFETBreakdown voltageElectric fieldCut-off frequency (FT)maximum oscillation frequency (Fmax)DisclaimerAs a service to authors and researchers we are providing this version of an accepted manuscript (AM). Copyediting, typesetting, and review of the resulting proofs will be undertaken on this manuscript before final publication of the Version of Record (VoR). During production and pre-press, errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal relate to these versions also. Data Availability StatementNo Data associated in the manuscript.