聂栩 Nie Xu, 王祖军 Wang Zujun, 王百川 Wang Baichuan, 薛院院 Xue Yuanyuan, 黄港 Huang Gang, 赖善坤 Lai Shankun, 唐宁 Tang Ning, 王茂成 Wang Maocheng, 赵铭彤 Zhao Mingtong, 杨馥羽 Yang Fuyu, 王忠明 Wang Zhongming
{"title":"不同偏置条件下CMOS图像传感器质子辐照损伤效应的实验与分析","authors":"聂栩 Nie Xu, 王祖军 Wang Zujun, 王百川 Wang Baichuan, 薛院院 Xue Yuanyuan, 黄港 Huang Gang, 赖善坤 Lai Shankun, 唐宁 Tang Ning, 王茂成 Wang Maocheng, 赵铭彤 Zhao Mingtong, 杨馥羽 Yang Fuyu, 王忠明 Wang Zhongming","doi":"10.3788/aos230592","DOIUrl":null,"url":null,"abstract":"应用在空间辐射环境下的互补金属氧化物半导体图像传感器（CIS）会受到高能质子辐照损伤，导致性能退化，严重时甚至功能失效。为了分析CIS高能质子辐照损伤机理，本文以0.18 μm工艺CIS为研究对象，利用西安200 MeV质子应用装置开展了注量分别为1×1010、5×1010、1×1011 p/cm2的100 MeV质子辐照实验。获得了单粒子瞬态响应的典型特征和暗信号、暗信号分布、暗信号尖峰及随机电码信号（RTS）等敏感参数的退化规律，揭示了不同偏置条件和不同注量下CIS高能质子辐照损伤的物理机制。实验结果表明：对暗信号而言，加偏置条件比未加偏置条件变化显著；质子辐照诱发的位移损伤和电离损伤引起暗信号的增大；位移损伤诱发的体缺陷诱发暗信号尖峰的产生，且随着辐照注量的增大而增多；空间电荷区中不同类型的体缺陷导致两能级和多能级RTS的产生。","PeriodicalId":7103,"journal":{"name":"光学学报","volume":null,"pages":null},"PeriodicalIF":1.6000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"不同偏置条件下CMOS图像传感器质子辐照损伤效应的实验与分析\",\"authors\":\"聂栩 Nie Xu, 王祖军 Wang Zujun, 王百川 Wang Baichuan, 薛院院 Xue Yuanyuan, 黄港 Huang Gang, 赖善坤 Lai Shankun, 唐宁 Tang Ning, 王茂成 Wang Maocheng, 赵铭彤 Zhao Mingtong, 杨馥羽 Yang Fuyu, 王忠明 Wang Zhongming\",\"doi\":\"10.3788/aos230592\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"应用在空间辐射环境下的互补金属氧化物半导体图像传感器（CIS）会受到高能质子辐照损伤，导致性能退化，严重时甚至功能失效。为了分析CIS高能质子辐照损伤机理，本文以0.18 μm工艺CIS为研究对象，利用西安200 MeV质子应用装置开展了注量分别为1×1010、5×1010、1×1011 p/cm2的100 MeV质子辐照实验。获得了单粒子瞬态响应的典型特征和暗信号、暗信号分布、暗信号尖峰及随机电码信号（RTS）等敏感参数的退化规律，揭示了不同偏置条件和不同注量下CIS高能质子辐照损伤的物理机制。实验结果表明：对暗信号而言，加偏置条件比未加偏置条件变化显著；质子辐照诱发的位移损伤和电离损伤引起暗信号的增大；位移损伤诱发的体缺陷诱发暗信号尖峰的产生，且随着辐照注量的增大而增多；空间电荷区中不同类型的体缺陷导致两能级和多能级RTS的产生。\",\"PeriodicalId\":7103,\"journal\":{\"name\":\"光学学报\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"光学学报\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3788/aos230592\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"光学学报","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3788/aos230592","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
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Researching is owned by Chinese Laser Press (CLP), which is established by Shanghai Institute of Optics and Fine Mechanics and Chinese Optical Society in 2009. Nowadays, CLP publishes 11 journals and manages three online platforms. Journal publishing activities include both traditional and digital models, and the first journal can be traced back to 1964. The CLP Online Library includes the CLP journals and partnered ones in China, and provides literature and intelligence services for users. The product platform, named as OEShow, connects sellers and buyers of optoelectronics products. Researching (formerly known as The CLP Publishing) is featured with stable operation and leading technology, collects CLP journals and partnered optics and photonics journals, and provides readers an optical publishing platform with global influence. CLP is on the way of building a modern publishing group combining traditional business and digital publishing.
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