王甜甜 Wang Tiantian, 何迪 He Di, 刘畅 Liu Chang, 邱钧 Qiu Jun
{"title":"基于频谱集中程度的重参数化在光场去噪中的应用","authors":"王甜甜 Wang Tiantian, 何迪 He Di, 刘畅 Liu Chang, 邱钧 Qiu Jun","doi":"10.3788/aos230659","DOIUrl":null,"url":null,"abstract":"从频谱支集对称程度及夹角两个结构特点出发，分析频谱支集结构变化对于去噪效果的影响，提出光场频谱支集集中程度的概念，并设计相应的度量函数。通过极小化集中程度度量函数，计算合适的光场双平面间距，按照此间距在去噪前对光场数据进行重参数化可以提高滤波去噪效果。HCI模拟光场数据和斯坦福实测光场数据实验结果表明，引入重参数化的光场滤波去噪方法能够优化去噪结果。从视觉上看，在滤除更多噪点的同时保留场景更多的结构和纹理信息；从定量评价上看，峰值信噪比和结构相似度指标也有所提高。","PeriodicalId":7103,"journal":{"name":"光学学报","volume":"26 1","pages":"0"},"PeriodicalIF":1.6000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"基于频谱集中程度的重参数化在光场去噪中的应用\",\"authors\":\"王甜甜 Wang Tiantian, 何迪 He Di, 刘畅 Liu Chang, 邱钧 Qiu Jun\",\"doi\":\"10.3788/aos230659\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"从频谱支集对称程度及夹角两个结构特点出发，分析频谱支集结构变化对于去噪效果的影响，提出光场频谱支集集中程度的概念，并设计相应的度量函数。通过极小化集中程度度量函数，计算合适的光场双平面间距，按照此间距在去噪前对光场数据进行重参数化可以提高滤波去噪效果。HCI模拟光场数据和斯坦福实测光场数据实验结果表明，引入重参数化的光场滤波去噪方法能够优化去噪结果。从视觉上看，在滤除更多噪点的同时保留场景更多的结构和纹理信息；从定量评价上看，峰值信噪比和结构相似度指标也有所提高。\",\"PeriodicalId\":7103,\"journal\":{\"name\":\"光学学报\",\"volume\":\"26 1\",\"pages\":\"0\"},\"PeriodicalIF\":1.6000,\"publicationDate\":\"2023-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"光学学报\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.3788/aos230659\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"光学学报","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.3788/aos230659","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
期刊介绍：
Researching is owned by Chinese Laser Press (CLP), which is established by Shanghai Institute of Optics and Fine Mechanics and Chinese Optical Society in 2009. Nowadays, CLP publishes 11 journals and manages three online platforms. Journal publishing activities include both traditional and digital models, and the first journal can be traced back to 1964. The CLP Online Library includes the CLP journals and partnered ones in China, and provides literature and intelligence services for users. The product platform, named as OEShow, connects sellers and buyers of optoelectronics products. Researching (formerly known as The CLP Publishing) is featured with stable operation and leading technology, collects CLP journals and partnered optics and photonics journals, and provides readers an optical publishing platform with global influence. CLP is on the way of building a modern publishing group combining traditional business and digital publishing.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
