{"title":"一种新型隧道晶体管的理论模型","authors":"P. Pfeffer","doi":"10.12693/aphyspola.144.137","DOIUrl":null,"url":null,"abstract":"A tunneling transistor without heterojunction as a theoretical design, or more precisely controlled electron current transmission by barrier potential, is under consideration. The electrons from the conduction band of the source tunnel through the forbidden gap $E_g$ of the channel to the conduction band of the drain. The tunneling current $J$ calculations made at helium temperature for the example InAs-InAs-InAs, Au-GaSe-Au and Al-AlN-Al structures show that for a constant source-drain voltage, $V_C$, of several mV, changes in the gate voltage, $V_G$, applied to the channel within the voltage range of 0 - $E_g/$2e change $J$ by even 10 orders of magnitude. Unlike the existing solutions such as tunnel field-effect-transistor (TFET), the proposed device uses the change of $V_G$ (gate voltage), i.e. the change of the electrostatic potential in the channel, to modify the imaginary wave vector $k_z$ of tunnel current electrons. Consequently, the gate voltage controls the damping force of the electrons wave functions and thus the magnitude of the tunneling current, $J$. The effect of increasing temperature, T, on $J(V_G)$ relation was also tested. It was found that only in structures with a wide forbidden channel gap this effect is insignificant (at least up to T=300 K).","PeriodicalId":7164,"journal":{"name":"Acta Physica Polonica A","volume":"6 1","pages":"0"},"PeriodicalIF":0.5000,"publicationDate":"2023-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Theoretical Model of a New Type Tunneling Transistor\",\"authors\":\"P. Pfeffer\",\"doi\":\"10.12693/aphyspola.144.137\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A tunneling transistor without heterojunction as a theoretical design, or more precisely controlled electron current transmission by barrier potential, is under consideration. The electrons from the conduction band of the source tunnel through the forbidden gap $E_g$ of the channel to the conduction band of the drain. The tunneling current $J$ calculations made at helium temperature for the example InAs-InAs-InAs, Au-GaSe-Au and Al-AlN-Al structures show that for a constant source-drain voltage, $V_C$, of several mV, changes in the gate voltage, $V_G$, applied to the channel within the voltage range of 0 - $E_g/$2e change $J$ by even 10 orders of magnitude. Unlike the existing solutions such as tunnel field-effect-transistor (TFET), the proposed device uses the change of $V_G$ (gate voltage), i.e. the change of the electrostatic potential in the channel, to modify the imaginary wave vector $k_z$ of tunnel current electrons. Consequently, the gate voltage controls the damping force of the electrons wave functions and thus the magnitude of the tunneling current, $J$. The effect of increasing temperature, T, on $J(V_G)$ relation was also tested. It was found that only in structures with a wide forbidden channel gap this effect is insignificant (at least up to T=300 K).\",\"PeriodicalId\":7164,\"journal\":{\"name\":\"Acta Physica Polonica A\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.5000,\"publicationDate\":\"2023-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Acta Physica Polonica A\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.12693/aphyspola.144.137\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Acta Physica Polonica A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.12693/aphyspola.144.137","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, MULTIDISCIPLINARY","Score":null,"Total":0}
Theoretical Model of a New Type Tunneling Transistor
A tunneling transistor without heterojunction as a theoretical design, or more precisely controlled electron current transmission by barrier potential, is under consideration. The electrons from the conduction band of the source tunnel through the forbidden gap $E_g$ of the channel to the conduction band of the drain. The tunneling current $J$ calculations made at helium temperature for the example InAs-InAs-InAs, Au-GaSe-Au and Al-AlN-Al structures show that for a constant source-drain voltage, $V_C$, of several mV, changes in the gate voltage, $V_G$, applied to the channel within the voltage range of 0 - $E_g/$2e change $J$ by even 10 orders of magnitude. Unlike the existing solutions such as tunnel field-effect-transistor (TFET), the proposed device uses the change of $V_G$ (gate voltage), i.e. the change of the electrostatic potential in the channel, to modify the imaginary wave vector $k_z$ of tunnel current electrons. Consequently, the gate voltage controls the damping force of the electrons wave functions and thus the magnitude of the tunneling current, $J$. The effect of increasing temperature, T, on $J(V_G)$ relation was also tested. It was found that only in structures with a wide forbidden channel gap this effect is insignificant (at least up to T=300 K).
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