A. Zykov, N. Yefymenko, S. Dudin, S. Yakovin, N. Azarenkov
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GENERATION OF COMPENSATED ION-ELECTRON FLOW IN THE COMBINED MAGNETRON-ION-PLASMA SYSTEM
The design and characteristics of the combined Magnetron-Ion-Plasma System (MIPS) are presented. The system includes a magnetron sputtering system and a Hall-type ion source with a common magnetic system and common power supply allowing the generation of quasi-neutral ion-electron flow, which provides complete charge neutralization on the processed dielectric surface. The formation of the anode electron layer and the energy spectra of ions are experimentally investigated. A phenomenological model of the combined discharge in EН fields is proposed. Theoretical calculations and experimental data are in reasonable agreement.
期刊介绍:
The journal covers the following topics:
Physics of Radiation Effects and Radiation Materials Science;
Nuclear Physics Investigations;
Plasma Physics;
Vacuum, Pure Materials and Superconductors;
Plasma Electronics and New Methods of Acceleration.