通过化学气相沉积工艺实现 p 型 CuI 薄膜晶体管

IF 0.3 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Korean Journal of Materials Research Pub Date : 2023-11-27 DOI:10.3740/mrsk.2023.33.11.491
Seungmin Lee, Seong Cheol Jang, Ji-Min Park, Soon-Gil Yoon, Hyunsook Kim
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p-type CuI Thin-Film Transistors through Chemical Vapor Deposition Process
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来源期刊
Korean Journal of Materials Research
Korean Journal of Materials Research MATERIALS SCIENCE, MULTIDISCIPLINARY-
CiteScore
0.50
自引率
33.30%
发文量
66
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