可见光照射下 BiVO4-TiO2 纳米复合光催化膜上 OH 自由基的形成:光催化还原通道的作用

Reactions Pub Date : 2024-01-22 DOI:10.3390/reactions5010004
Shizu Terao, Yoshinori Murakami
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引用次数: 0

摘要

在本研究中,我们研究了添加 H2O2 对可见光照射的 BiVO4-TiO2 纳米复合光催化剂表面 OH 自由基形成的影响。此外,我们还研究了 H2O2 在光催化 BiVO4-TiO2 纳米复合材料可见光照射表面的还原反应形成的 OH 自由基的可能作用。BiVO4-TiO2 纳米复合光催化剂是将 BiVO4 光催化薄膜与市售的半导体微粒 TiO2 光催化剂混合制备而成的。通过去除光催化反应器中的氧气,研究了在可见光照射 BiVO4-TiO2 纳米复合光催化剂时,氧分子对 OH 自由基形成的影响。在可见光辐照过程中,BiVO4 和 BiVO4-TiO2 光催化剂在 OH 自由基的形成过程中发挥着不同的作用,这是因为它们具有两种特征性的还原反应途径:(a)H2O2 在光催化表面的直接还原反应;(b)H2O2 被超氧自由基阴离子(O2-)的间接还原反应。
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Formation of OH Radicals on BiVO4–TiO2 Nanocomposite Photocatalytic Film under Visible-Light Irradiation: Roles of Photocatalytic Reduction Channels
In this study, we investigated the effects of H2O2 addition on OH radical formation on the surfaces of visible-light-irradiated BiVO4–TiO2 nanocomposite photocatalysts. Additionally, we examined the possible roles of OH radicals formed by the reduction reaction of H2O2 on the visible-light-irradiated surfaces of photocatalytic BiVO4–TiO2 nanocomposites. The BiVO4–TiO2 nanocomposite photocatalysts were prepared by mixing a BiVO4 photocatalytic film with commercially available semiconductor particulate TiO2 photocatalysts. By removing oxygen gas from the photocatalytic reactor, the effects of oxygen molecules on OH radical formation during the visible-light irradiation of BiVO4–TiO2 nanocomposite photocatalysts were examined. During visible-light irradiation, BiVO4 and BiVO4–TiO2 photocatalysts play different roles in OH radical formation because of two characteristic reduction reaction channels: (a) the direct reduction of H2O2 on photocatalytic surfaces and (b) the indirect reduction reaction of H2O2 by superoxide radical anions (O2−).
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