{"title":"使用 PID 和多模型控制的达玛万德托卡马克真空容器增强型压力控制系统","authors":"Mahdi Amini , Mahdi Aliyari Shoorehdeli , Hossein Rasouli","doi":"10.1016/j.jprocont.2024.103174","DOIUrl":null,"url":null,"abstract":"<div><p><span><span>This paper presents the implementation of the pressure control system for the vacuum vessel of Damavand Tokamak. PID controllers within the framework of multiple-model control are utilized for controller design<span>, aiming to safely achieve the desired setpoint for the pressure of the vacuum vessel. The chamber pressure is measured in real-time using a </span></span>Cold Cathode </span>Pirani gauge<span> and transferred as feedback to the controller. There is a gas injection system<span> to adjust the chamber pressure. Multiple process models are derived for the vacuum vessel pressure based on a system identification approach using the experimental data from the process. The derived models are employed in designing the PID controllers. The designed controllers are implemented on the tokamak gas injection system. The experimental results demonstrate that the designed controllers effectively track the desired pressure profile.</span></span></p></div>","PeriodicalId":50079,"journal":{"name":"Journal of Process Control","volume":null,"pages":null},"PeriodicalIF":3.3000,"publicationDate":"2024-02-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Enhanced pressure control system for the vacuum vessel of Damavand Tokamak using PID and multiple model control\",\"authors\":\"Mahdi Amini , Mahdi Aliyari Shoorehdeli , Hossein Rasouli\",\"doi\":\"10.1016/j.jprocont.2024.103174\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p><span><span>This paper presents the implementation of the pressure control system for the vacuum vessel of Damavand Tokamak. PID controllers within the framework of multiple-model control are utilized for controller design<span>, aiming to safely achieve the desired setpoint for the pressure of the vacuum vessel. The chamber pressure is measured in real-time using a </span></span>Cold Cathode </span>Pirani gauge<span> and transferred as feedback to the controller. There is a gas injection system<span> to adjust the chamber pressure. Multiple process models are derived for the vacuum vessel pressure based on a system identification approach using the experimental data from the process. The derived models are employed in designing the PID controllers. The designed controllers are implemented on the tokamak gas injection system. The experimental results demonstrate that the designed controllers effectively track the desired pressure profile.</span></span></p></div>\",\"PeriodicalId\":50079,\"journal\":{\"name\":\"Journal of Process Control\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":3.3000,\"publicationDate\":\"2024-02-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Process Control\",\"FirstCategoryId\":\"94\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0959152424000143\",\"RegionNum\":2,\"RegionCategory\":\"计算机科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q2\",\"JCRName\":\"AUTOMATION & CONTROL SYSTEMS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Process Control","FirstCategoryId":"94","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0959152424000143","RegionNum":2,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"AUTOMATION & CONTROL SYSTEMS","Score":null,"Total":0}
Enhanced pressure control system for the vacuum vessel of Damavand Tokamak using PID and multiple model control
This paper presents the implementation of the pressure control system for the vacuum vessel of Damavand Tokamak. PID controllers within the framework of multiple-model control are utilized for controller design, aiming to safely achieve the desired setpoint for the pressure of the vacuum vessel. The chamber pressure is measured in real-time using a Cold Cathode Pirani gauge and transferred as feedback to the controller. There is a gas injection system to adjust the chamber pressure. Multiple process models are derived for the vacuum vessel pressure based on a system identification approach using the experimental data from the process. The derived models are employed in designing the PID controllers. The designed controllers are implemented on the tokamak gas injection system. The experimental results demonstrate that the designed controllers effectively track the desired pressure profile.
期刊介绍:
This international journal covers the application of control theory, operations research, computer science and engineering principles to the solution of process control problems. In addition to the traditional chemical processing and manufacturing applications, the scope of process control problems involves a wide range of applications that includes energy processes, nano-technology, systems biology, bio-medical engineering, pharmaceutical processing technology, energy storage and conversion, smart grid, and data analytics among others.
Papers on the theory in these areas will also be accepted provided the theoretical contribution is aimed at the application and the development of process control techniques.
Topics covered include:
• Control applications• Process monitoring• Plant-wide control• Process control systems• Control techniques and algorithms• Process modelling and simulation• Design methods
Advanced design methods exclude well established and widely studied traditional design techniques such as PID tuning and its many variants. Applications in fields such as control of automotive engines, machinery and robotics are not deemed suitable unless a clear motivation for the relevance to process control is provided.