{"title":"利用分光光度法和原子力显微镜成像研究超薄银层和金层","authors":"R. Shurvinton","doi":"10.1051/jeos/2024005","DOIUrl":null,"url":null,"abstract":"A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO2. This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1nm. Experimental index values are given for Ag and Au over the wavelength range of 370-835nm. These results are correlated with AFM images of the films, which reveal dramatic changes in structure for layers of different thickness.","PeriodicalId":674,"journal":{"name":"Journal of the European Optical Society-Rapid Publications","volume":null,"pages":null},"PeriodicalIF":1.9000,"publicationDate":"2024-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Investigating Ultra-thin Ag and Au Layers Using Spectrophotometry and AFM Imaging\",\"authors\":\"R. Shurvinton\",\"doi\":\"10.1051/jeos/2024005\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO2. This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1nm. Experimental index values are given for Ag and Au over the wavelength range of 370-835nm. These results are correlated with AFM images of the films, which reveal dramatic changes in structure for layers of different thickness.\",\"PeriodicalId\":674,\"journal\":{\"name\":\"Journal of the European Optical Society-Rapid Publications\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.9000,\"publicationDate\":\"2024-02-12\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of the European Optical Society-Rapid Publications\",\"FirstCategoryId\":\"4\",\"ListUrlMain\":\"https://doi.org/10.1051/jeos/2024005\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"OPTICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of the European Optical Society-Rapid Publications","FirstCategoryId":"4","ListUrlMain":"https://doi.org/10.1051/jeos/2024005","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"OPTICS","Score":null,"Total":0}
Investigating Ultra-thin Ag and Au Layers Using Spectrophotometry and AFM Imaging
A spectrophotometric method is demonstrated for refractive index and thickness determination of thin and ultrathin metallic films. The method involves a three-layer stack where the metallic layer of interest is deposited on an opaque Si wafer coated with SiO2. This stack creates oscillations in the reflectance spectrum, which are highly sensitive to the index of the metallic film, allowing precise determination of the index of layers down to 1nm. Experimental index values are given for Ag and Au over the wavelength range of 370-835nm. These results are correlated with AFM images of the films, which reveal dramatic changes in structure for layers of different thickness.
期刊介绍:
Rapid progress in optics and photonics has broadened its application enormously into many branches, including information and communication technology, security, sensing, bio- and medical sciences, healthcare and chemistry.
Recent achievements in other sciences have allowed continual discovery of new natural mysteries and formulation of challenging goals for optics that require further development of modern concepts and running fundamental research.
The Journal of the European Optical Society – Rapid Publications (JEOS:RP) aims to tackle all of the aforementioned points in the form of prompt, scientific, high-quality communications that report on the latest findings. It presents emerging technologies and outlining strategic goals in optics and photonics.
The journal covers both fundamental and applied topics, including but not limited to:
Classical and quantum optics
Light/matter interaction
Optical communication
Micro- and nanooptics
Nonlinear optical phenomena
Optical materials
Optical metrology
Optical spectroscopy
Colour research
Nano and metamaterials
Modern photonics technology
Optical engineering, design and instrumentation
Optical applications in bio-physics and medicine
Interdisciplinary fields using photonics, such as in energy, climate change and cultural heritage
The journal aims to provide readers with recent and important achievements in optics/photonics and, as its name suggests, it strives for the shortest possible publication time.