缩小表面物理学与光子学之间的差距。

Pekka Laukkanen, Marko Punkkinen, Mikhail Kuzmin, Kalevi Kokko, Xiaolong Liu, Behrad Radfar, Ville Vähänissi, Hele Savin, Antti Tukiainen, Teemu Hakkarainen, Jukka Viheriälä, Mircea Guina
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引用次数: 0

摘要

在信息与通信、照明和光伏等各种应用领域,光子设备的使用和性能标准不断提高。在许多当前和未来的光子设备中,半导体晶体表面是一个薄弱环节,会造成严重的光电损耗和应用故障。这些表面难题很多是由半导体表面的材料缺陷引起的,例如波导中的信号衰减、发光二极管中的光吸收、太阳能电池中载流子的非辐射重组、光电二极管的漏(暗)电流以及太阳能电池界面的光反射等。为了减少有害的表面效应,设备的光学和电学钝化技术已经发展了几十年,尤其是在半导体技术方面。由于原子尺度的控制和对表面相关现象的了解与提高不同设备的性能息息相关,因此加强表面物理学与光子学的衔接可能会有所帮助。为了实现这一目标,我们回顾了一些不断发展的研究课题,并提出了一些开放性问题和可能的解决方案,希望能为光子设备钝化与表面物理之间的联系提供一些实例。其中一个问题与湿化学清洗半导体表面的特性有关,半导体表面通常用于设备制造工艺中,但似乎与物理学家在超高真空中研究的晶体表面不同。在设备中,有缺陷的半导体表面通常位于由半导体晶体上生长的金属薄膜或绝缘体薄膜形成的嵌入式界面上,这就给测量其原子和电子结构带来了困难。要了解这些界面特性,必须结合量子力学模拟方法。本综述还涉及金属-半导体界面,这些界面包含在大多数光子设备中,用于向半导体结构传输载流子。具有超薄隧穿势垒的低电阻和钝化接触是控制光子设备电损耗的新兴解决方案。
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Bridging the gap between surface physics and photonics.

Use and performance criteria of photonic devices increase in various application areas such as information and communication, lighting, and photovoltaics. In many current and future photonic devices, surfaces of a semiconductor crystal are a weak part causing significant photo-electric losses and malfunctions in applications. These surface challenges, many of which arise from material defects at semiconductor surfaces, include signal attenuation in waveguides, light absorption in light emitting diodes, non-radiative recombination of carriers in solar cells, leakage (dark) current of photodiodes, and light reflection at solar cell interfaces for instance. To reduce harmful surface effects, the optical and electrical passivation of devices has been developed for several decades, especially with the methods of semiconductor technology. Because atomic scale control and knowledge of surface-related phenomena have become relevant to increase the performance of different devices, it might be useful to enhance the bridging of surface physics to photonics. Toward that target, we review some evolving research subjects with open questions and possible solutions, which hopefully provide example connecting points between photonic device passivation and surface physics. One question is related to the properties of the wet chemically cleaned semiconductor surfaces which are typically utilized in device manufacturing processes, but which appear to be different from crystalline surfaces studied in ultrahigh vacuum by physicists. In devices, a defective semiconductor surface often lies at an embedded interface formed by a thin metal or insulator film grown on the semiconductor crystal, which makes the measurements of its atomic and electronic structures difficult. To understand these interface properties, it is essential to combine quantum mechanical simulation methods. This review also covers metal-semiconductor interfaces which are included in most photonic devices to transmit electric carriers to the semiconductor structure. Low-resistive and passivated contacts with an ultrathin tunneling barrier are an emergent solution to control electrical losses in photonic devices.

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