{"title":"合成和优化全息掩模的有效方法","authors":"V. V. Chernik","doi":"10.1134/S1028335823100038","DOIUrl":null,"url":null,"abstract":"<p>Several statements of the problems of synthesis of a holographic mask in the form of optimization problems for quality of holographic images are presented. An effective algorithm for the synthesis of holographic masks based on FFT with the complexity <i>O</i>(<i>N</i>ln<i>N</i>), where <i>N</i> is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS, and high-end chips. Experimental results are presented.</p>","PeriodicalId":533,"journal":{"name":"Doklady Physics","volume":"68 10","pages":"328 - 333"},"PeriodicalIF":0.6000,"publicationDate":"2024-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effective Methods of Synthesis and Optimization of a Holographic Mask\",\"authors\":\"V. V. Chernik\",\"doi\":\"10.1134/S1028335823100038\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<p>Several statements of the problems of synthesis of a holographic mask in the form of optimization problems for quality of holographic images are presented. An effective algorithm for the synthesis of holographic masks based on FFT with the complexity <i>O</i>(<i>N</i>ln<i>N</i>), where <i>N</i> is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS, and high-end chips. Experimental results are presented.</p>\",\"PeriodicalId\":533,\"journal\":{\"name\":\"Doklady Physics\",\"volume\":\"68 10\",\"pages\":\"328 - 333\"},\"PeriodicalIF\":0.6000,\"publicationDate\":\"2024-02-20\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Doklady Physics\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://link.springer.com/article/10.1134/S1028335823100038\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MECHANICS\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Doklady Physics","FirstCategoryId":"101","ListUrlMain":"https://link.springer.com/article/10.1134/S1028335823100038","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MECHANICS","Score":null,"Total":0}
引用次数: 0
摘要
摘要 本文以全息图像质量优化问题的形式对全息图像合成问题进行了若干阐述。介绍了一种基于 FFT 的全息光罩合成的有效算法，其复杂度为 O(NlnN)，其中 N 是所描绘对象的元素数。基于该算法，我们开发并实施了一个可扩展的软件包，可为各种光刻应用合成全息掩膜，包括生产微机电系统（MEMS）、微机电系统（MOEMS）和高端芯片。实验结果已公布。
Effective Methods of Synthesis and Optimization of a Holographic Mask
Several statements of the problems of synthesis of a holographic mask in the form of optimization problems for quality of holographic images are presented. An effective algorithm for the synthesis of holographic masks based on FFT with the complexity O(NlnN), where N is the number of elements of the depicted object, is described. Based on this algorithm, a scalable software package has been developed and implemented that allows synthesizing holographic masks for various lithography applications, including the production of MEMS, MOEMS, and high-end chips. Experimental results are presented.
期刊介绍：
Doklady Physics is a journal that publishes new research in physics of great significance. Initially the journal was a forum of the Russian Academy of Science and published only best contributions from Russia in the form of short articles. Now the journal welcomes submissions from any country in the English or Russian language. Every manuscript must be recommended by Russian or foreign members of the Russian Academy of Sciences.
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