{"title":"利用纳米压印折射率的有效介质元表面:设计、性能和预测公差分析","authors":"Matthew Panipinto and Judson D. Ryckman","doi":"10.1364/ome.515617","DOIUrl":null,"url":null,"abstract":"Production of flat optics incorporating subwavelength features, particularly at visible frequencies, remains a significant challenge. Here, we establish a framework for the design of effective medium metasurfaces (EMM), relying on nanoimprinting of mesoporous silicon to realize a patterned refractive index <i>n</i>(x,y) corresponding to an arbitrary transmitted phase profile <i>ϕ</i>(x,y). The method is used to design the stamp profile required to produce a Fresnel lens and the theoretical performance of the metalens is examined using the finite-difference time-domain method. Additionally, we demonstrate neural network aided Monte Carlo analysis as a method to model the effects of metasurface fabrications errors on EMM performance and process yield.","PeriodicalId":19548,"journal":{"name":"Optical Materials Express","volume":null,"pages":null},"PeriodicalIF":2.8000,"publicationDate":"2024-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effective medium metasurfaces using nanoimprinting of the refractive index: design, performance, and predictive tolerance analysis\",\"authors\":\"Matthew Panipinto and Judson D. Ryckman\",\"doi\":\"10.1364/ome.515617\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Production of flat optics incorporating subwavelength features, particularly at visible frequencies, remains a significant challenge. Here, we establish a framework for the design of effective medium metasurfaces (EMM), relying on nanoimprinting of mesoporous silicon to realize a patterned refractive index <i>n</i>(x,y) corresponding to an arbitrary transmitted phase profile <i>ϕ</i>(x,y). The method is used to design the stamp profile required to produce a Fresnel lens and the theoretical performance of the metalens is examined using the finite-difference time-domain method. Additionally, we demonstrate neural network aided Monte Carlo analysis as a method to model the effects of metasurface fabrications errors on EMM performance and process yield.\",\"PeriodicalId\":19548,\"journal\":{\"name\":\"Optical Materials Express\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":2.8000,\"publicationDate\":\"2024-03-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Optical Materials Express\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.1364/ome.515617\",\"RegionNum\":3,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Materials Express","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1364/ome.515617","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Effective medium metasurfaces using nanoimprinting of the refractive index: design, performance, and predictive tolerance analysis
Production of flat optics incorporating subwavelength features, particularly at visible frequencies, remains a significant challenge. Here, we establish a framework for the design of effective medium metasurfaces (EMM), relying on nanoimprinting of mesoporous silicon to realize a patterned refractive index n(x,y) corresponding to an arbitrary transmitted phase profile ϕ(x,y). The method is used to design the stamp profile required to produce a Fresnel lens and the theoretical performance of the metalens is examined using the finite-difference time-domain method. Additionally, we demonstrate neural network aided Monte Carlo analysis as a method to model the effects of metasurface fabrications errors on EMM performance and process yield.
期刊介绍:
The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.
Optical Materials Express (OMEx), OSA''s open-access, rapid-review journal, primarily emphasizes advances in both conventional and novel optical materials, their properties, theory and modeling, synthesis and fabrication approaches for optics and photonics; how such materials contribute to novel optical behavior; and how they enable new or improved optical devices. The journal covers a full range of topics, including, but not limited to:
Artificially engineered optical structures
Biomaterials
Optical detector materials
Optical storage media
Materials for integrated optics
Nonlinear optical materials
Laser materials
Metamaterials
Nanomaterials
Organics and polymers
Soft materials
IR materials
Materials for fiber optics
Hybrid technologies
Materials for quantum photonics
Optical Materials Express considers original research articles, feature issue contributions, invited reviews, and comments on published articles. The Journal also publishes occasional short, timely opinion articles from experts and thought-leaders in the field on current or emerging topic areas that are generating significant interest.