通过电流顺应电路进行多级设置的高密度通孔 RRAM 单元。

0 MATERIALS SCIENCE, MULTIDISCIPLINARY Discover nano Pub Date : 2024-03-25 DOI:10.1186/s11671-023-03881-x
Yu-Cheng Hsieh, Yu-Cheng Lin, Yao-Hung Huang, Yu-Der Chih, Jonathan Chang, Chrong-Jung Lin, Ya-Chin King
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引用次数: 0

摘要

在这项工作中,首次报告并演示了采用标准 FinFET CMOS 逻辑工艺的通孔 RRAM 中的多级存储。通孔 RRAM 中的多级状态是通过在设置操作过程中控制电流顺从性来实现的。我们提出了新的电流顺应性设置电路,以确保在考虑工艺变化效应下的单元时实现稳定的电阻控制。已成功证明了通孔 RRAM 稳定性的提高和多级状态分布的收紧。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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High-density via RRAM cell with multi-level setting by current compliance circuits.

In this work, multi-level storage in the via RRAM has been first time reported and demonstrated with the standard FinFET CMOS logic process. Multi-level states in via RRAM are achieved by controlling the current compliance during set operations. The new current compliance setting circuits are proposed to ensure stable resistance control when one considers cells under the process variation effect. The improved stability and tightened distributions on its multi-level states on via RRAM have been successfully demonstrated.

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