掺杂 Eu3+ 的氧化锌涂层 CaF2 薄膜在电子束辐照下的稳定性研究

R. A. A. Abdallah, R. Kroon, E. Coetsee, E. Hasabeldaim, H. Swart
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摘要

采用水热法成功制备了掺杂 Eu3+ 离子的 CaF2 薄膜,并通过旋涂技术进行了镀膜。利用脉冲激光技术在掺杂 Eu3+ 的 CaF2 薄膜上沉积了一层薄薄的 ZnO。X 射线粉末衍射和 X 射线光电子能谱(XPS)证实了掺杂剂在 CaF2 晶体中的掺入。在 227 纳米波长下激发薄膜会产生 Eu3+ 离子的特征辐射。利用欧杰电子能谱、阴极发光(CL)和 XPS 研究了薄膜在电子束轰击下的稳定性。阴极发光和奥杰峰峰高(APPHs)数据是使用同一电子束同时采集的。Ca 和 O 的 APPH 增加,而 F 的 APPH 降低,这表明 CaF2 已转化为 CaO。在降解过程中,CL 发射最初有所下降,而对于带有氧化锌涂层的薄膜,CL 发射在超过 48 C/cm2 后趋于稳定。XPS 分析还表明,电子束降解后,氟化物解离,随后形成氧化物,如 CaO 和 EuO。
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Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation
Eu3+ ion doped CaF2 thin film was successfully prepared using the hydrothermal method and coated by a spin coating technique. A thin layer of ZnO was deposited on the Eu3+ doped CaF2 thin film by pulsed laser technique. Incorporation of the dopant into the CaF2 crystal was confirmed by x-ray powder diffraction and x-ray photoelectron spectroscopy (XPS). Excitation of the film at 227 nm produced the characteristic emissions of Eu3+ ions. The stability of the film under electron beam bombard was studied using Auger electron spectroscopy, cathodoluminescence (CL), and XPS. The CL and Auger peak-to-peak heights (APPHs) data were collected concurrently using the same electron beam. The APPH of Ca and O increased, while that of F decreased, which indicated the conversion of CaF2 to CaO. The CL emission decreased initially during degradation and stabilized beyond 48 C/cm2 for the film with the ZnO coating. XPS analysis also indicated the dissociation of the fluoride compounds and subsequent formation of oxide compounds such as CaO and EuO after electron beam degradation.
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