退火温度对通过磁控溅射沉积在 ZK60A 上的铝硅复合镀层化学成分的影响

Ashish Kumar Singh, Nikokajs Glizde, K. Savkovs
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摘要

本文研究了热处理温度对 ZK60A 合金上的铝硅复合涂层成分的影响。这些涂层是利用磁控溅射沉积技术开发的。这些涂层可作为镁合金在水介质中的有效防腐蚀屏障。磁控溅射靶的成分是 80% 的铝和 20% 的硅,而沉积涂层的成分是 78% 的铝和 18% 的硅,其余的原子来自基底。沉积的涂层有气孔,而铝硅复合材料是以球状沉积的。溅射涂层分别在 420 ℃(HT1)和 350 ℃(HT2)下热处理 1.5 小时。由于基底-涂层界面之间的扩散以及涂层中存在的孔隙迁移,热处理涂层中的元素比例发生了显著变化。研究发现,镁迁移到涂层中,而硅迁移到基底中。经过 HT1 和 HT2 后,涂层中的铝/镁比率分别降低了 81.2% 和 60.6%。
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Influence of Annealing Temperature on the Chemical Composition of Composite Al-Si Coating Deposited via Magnetron Sputtering on ZK60A
In this paper, the effect of heat treatment temperature on the resultant composition of composite Al-Si coatings on ZK60A alloy investigated. The coatings were developed using magnetron sputtering deposition. These coatings can serve as an effective anti-corrosion barrier for Mg alloys in aqueous mediums. The magnetron target composition was 80% Al and 20% Si, while in the deposited coating it was 78% Al and 18% Si, with the rest being atoms from the substrate. The as-deposited coatings had pores and the Al-Si composite was deposited in the form of globules. The sputtered coatings were subjected to heat treatment for 1.5 hours at 420 °C (HT1) and 350 °C (HT2). The ratio of elements in the heat-treated coatings changed significantly due to diffusion between substrate-coating interface and migration through the pores that exist in the coating. It was found that Mg migrates into the coating and Si into the substrate. Al/Mg ratio reduced by 81.2 and 60.6 %, respectively, in the coating after the HT1 and HT2.
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