利用蒸汽捕集法在芯片上生长一维 In2O3 纳米结构及其气体传感性能比较

Hong Phuoc Phan, Manh Hung Chu, Van Duy Nguyen, D. Nguyen, Manh Hung Nguyen, N. Nguyen, V. Nguyen
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引用次数: 0

摘要

在本研究中,我们采用化学气相沉积捕集法生长了各种一维(1D)氧化铟(In2O3)纳米结构,即纳米棒(NRs)、纳米针(NNs)和纳米线(NWs)。利用 X 射线衍射和扫描电子显微镜分析了合成纳米结构的结构和形态特征。通过将不同生长条件下 In2O3 的形态与之前的研究成果进行比较,我们研究了其生长机制和金催化剂的作用。In2O3 传感器对 C2H5OH 气体具有良好的选择性。与基于 NRs(45%,35 秒/339 秒)和 NNs(8%,70 秒/496 秒)的传感器相比,基于 NWs 的传感器在 400 °C 下暴露于 200 ppm C2H5OH 时,具有更高的响应速度和更快的响应恢复速度(50%,49 秒/343 秒)。此外,这些传感器在开关可逆循环中表现出良好的稳定性。线性判别分析(LDA)模型在温度为 350 ℃-450 ℃ 时有效地对 25-200 ppm C2H5OH、NH3 和 CO 等目标气体进行了分类。我们认为,氮氧化物传感器之所以具有更好的气体传感性能,是因为它的形态有利于气体扩散和损耗深度的调节。
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On-chip growth of one-dimensional In2O3 nanostructures by vapor trapping method and their comparative gas-sensing performance
In this study, we use the chemical vapour deposition trapping method to grow various one-dimensional (1D) indium oxide (In2O3) nanostructures, namely nanorods (NRs), nanoneedles (NNs), and nanowires (NWs). The structural and morphological characteristics of the synthesised nanostructures are analysed using x-ray diffraction and scanning electron microscopy. By comparing the morphology of In2O3 under different growth conditions with previous research findings, we investigate the growth mechanism and the role of gold catalysts. The In2O3 sensor presented a good selection for C2H5OH gas. The NWs-based sensor exhibits a superior response and faster response-recovery rates (50%, and 49 s/343 s) in comparison to the NRs- (45%, and 35 s/339 s) and NNs-based sensors (8%, and 70 s/496 s) when exposed to 200 ppm C2H5OH at 400 °C. Besides, the sensors exhibited good stability under the switch-off reversible cycle. The linear discriminant analysis (LDA) model was effectively used in classifying target gases such as 25–200 ppm C2H5OH, NH3, and CO at the temperature of 350 °C–450 °C. We attribute the NWs-based sensor’s better gas-sensing performance to its favourable morphology for gas diffusion and modulation of depletion depth.
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来源期刊
Advances in Natural Sciences: Nanoscience and Nanotechnology
Advances in Natural Sciences: Nanoscience and Nanotechnology Engineering-Industrial and Manufacturing Engineering
CiteScore
3.80
自引率
0.00%
发文量
60
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