单层氮化铟中的高次谐波生成

IF 1.5 4区 物理与天体物理 Q3 OPTICS Journal of Physics B: Atomic, Molecular and Optical Physics Pub Date : 2024-03-12 DOI:10.1088/1361-6455/ad2e2e
Xiaoyu Liu, Zhiqiang Ji, Chenglong Wu, Shasha Li, Hong Wu, Feng Li, Yong Pu
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引用次数: 0

摘要

在我们的工作中,我们基于半导体布洛赫方程,从理论上研究了单层六方氮化铟(h-InN)在强激光场下的高次谐波发生(HHG)。与 h-BN 相比,h-InN 中不存在多峰。这是因为带内机制主导了整个 HHG,而带内电流产生的谐波比带间极化产生的谐波高出约三个数量级。我们发现 HHG 的高阶部分主要由带间电流提供,这可以根据能带间的过渡偶极矩来分析。此外,我们还发现 h-InN 的 HHG 对外部应变很敏感,这是由于电子结构中的带色散发生了改变。这项研究为理解激光与固体相互作用的微观机制提供了有益的参考。
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High harmonic generation in monolayer indium nitride
In our work, we theoretically investigate high harmonic generation (HHG) in monolayer hexagonal indium nitride (h-InN) based on the semiconductor Bloch equation under strong laser fields. Compared with h-BN, there is no multiplateau in h-InN. This is because the intraband mechanism dominates the total HHG, and the harmonic generated by the intraband current is about three orders of magnitude higher than that generated by the interband polarization. We find that the higher order part of the HHG is mainly supplied by the interband current, which can be analyzed on the basis of the transition dipole moments between the energy bands. In addition, we found that the HHG of h-InN is sensitive to the external strains due to the modified band dispersion in the electronic structures. This study provides a useful reference for understanding the microscopic mechanism of laser-solid interaction.
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来源期刊
CiteScore
3.60
自引率
6.20%
发文量
182
审稿时长
2.8 months
期刊介绍: Published twice-monthly (24 issues per year), Journal of Physics B: Atomic, Molecular and Optical Physics covers the study of atoms, ions, molecules and clusters, and their structure and interactions with particles, photons or fields. The journal also publishes articles dealing with those aspects of spectroscopy, quantum optics and non-linear optics, laser physics, astrophysics, plasma physics, chemical physics, optical cooling and trapping and other investigations where the objects of study are the elementary atomic, ionic or molecular properties of processes.
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