β-Ga2O3结构中原生缺陷和铟合金化的计算研究和离子扩散分析

N. R. Martins, Luiz Augusto Ferreira de Campos Viana, Alan Antônio das Graças Santos, Daiane Damasceno Borges, Eric Welch, P. Borges, L. Scolfaro
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摘要

像氧化镓这样的宽带隙半导体是大功率光电器件应用的理想材料。我们在此展示了对 β-Ga2O3 中不同缺陷扩散途径的密度泛函理论和分子动力学综合研究。与密度泛函理论相比,分子动力学模拟的平衡体积更小,但即使在包含缺陷的情况下,除了为适应缺陷的存在而发生的局部变形外,整体晶格仍保持相对不变。温度升高会产生轻微的热膨胀,结合电子局域函数和巴德电荷分析可以发现,随着温度的升高,氧间隙是流动性最强的缺陷。然而,由于缺陷和晶格之间的电荷转移量相对较小,间隙阳离子可能会在高温下扩散。流动性氧缺陷可增加氧离子在晶格中的流动性,通过退火工艺加以控制,可有利于电化学应用。
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Computational study and ion diffusion analyses of native defects and indium alloying in β-Ga2O3 structures
Wide band gap semiconductors like gallium oxide are promising materials for high-power optoelectronic device applications. We show here a combined density functional theory and molecular dynamics study of diffusion pathways for different defects in β-Ga2O3. Molecular dynamics simulations result in a smaller equilibrium volume compared to density functional theory, but the overall lattice remains relatively unchanged even with the inclusion of defects, outside of the local distortions that occur to accommodate the presence of a defect. Slight thermal expansion occurs with elevated temperature and a combination of electron localization function and Bader charge analysis reveals that the oxygen interstitial is the most mobile defect as temperature is increased. However, interstitial cations may diffuse at elevated temperature due to a relatively small amount of charge transfer between the defect and lattice. The mobile oxygen defects are shown to increase the mobility of oxygen ions from the lattice, which can be beneficial for electrochemical applications when controlled through annealing processes.
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