Study on fs-laser machining of optical waveguides and cavities in ULE® glass

The potential of ultrafast laser machining for the design of integrated optical devices in ULE® glass, a material known for its low coefficient of thermal expansion (CTE), is addressed. This was done through laser direct writing and characterization of optical waveguides and through the fabrication of 3D cavities inside the glass by following laser irradiation with chemical etching. Type I optical waveguides were produced and their internal loss mechanisms at 1550 nm were studied. Coupling losses lower than 0.2 dB cm−1 were obtained within a wide processing window. However, propagation loss lower than 4.2–4.3 dB cm−1 could not be realized, unlike in other glasses, due to laser-induced photodarkening. Selective-induced etching was observed over a large processing window and found to be maximum when irradiating the glass with a fs-laser beam linearly polarised orthogonally to the scanning direction, akin to what is observed in fused silica laser-machined microfluidic channels. In fact, the etching selectivity and surface roughness of laser-machined ULE® glass was found to be similar to that of fused silica, allowing some of the already reported microfluidic and optofluidic devices to be replicated in this low CTE glass. An example of a 3D cavity with planar-spherically convex interfaces is given. Due to the thermal properties of ULE® glass, these cavities can be employed as interferometers for wavelength and/or temperature referencing.