Choluk Oh, O. Kwon, Younghun Bae, Hyejin Shin, Young Min Kwon, Byungjin Cho
{"title":"优化离子束辅助 Y2O3 薄膜沉积工艺以提高等离子体电阻率","authors":"Choluk Oh, O. Kwon, Younghun Bae, Hyejin Shin, Young Min Kwon, Byungjin Cho","doi":"10.3365/kjmm.2024.62.5.340","DOIUrl":null,"url":null,"abstract":"A ceramic-based plasma etcher window (Lid) requires robust resistance to plasma, especially when exposed to harsh fluorine-based plasma conditions. In this study, a Y<sub>2</sub>O<sub>4</sub> film was deposited using e-beam evaporation with ion beam-assisted deposition (IBAD), and the physical properties of the IBAD-based Y<sub>2</sub>O<sub>4</sub> coating film were thoroughly examined to enhance the mechanical and chemical resistance of the ceramic part, including the Y<sub>2</sub>O<sub>4</sub> film, against etching plasma. The hardness and surface morphology of the IBADbased Y<sub>2</sub>O<sub>4</sub> could be precisely controlled by various deposition processing parameters, such as beam voltage, beam current, and Ar/O2 gas ratio. Following the IBAD deposition of the Y<sub>2</sub>O<sub>4</sub> film, a plasma etching process (Ar/CF<sub>4</sub> mixture gases with 150 W RF power for 60 minutes) was applied to evaluate the plasma resistance of the deposited Y<sub>2</sub>O<sub>4</sub> coating film. The surface morphology characteristics of the Y<sub>2</sub>O<sub>4</sub> films were compared using atomic force microscopy, and their grain size was studied through scanning electron microscopy image analysis. Furthermore, a nanoindenter was used to determine the hardness of the Y<sub>2</sub>O<sub>4</sub> film. These results suggest that optimizing the IBAD coating process requires an in-depth study that fully considers the correlation between deposition processing parameters and physical properties. This optimization can be instrumental for enhancing the durability of the ceramic part.","PeriodicalId":17894,"journal":{"name":"Korean Journal of Metals and Materials","volume":null,"pages":null},"PeriodicalIF":1.1000,"publicationDate":"2024-05-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optimization of Ion Beam-Assisted Deposition Process for Y2O3 Film to Enhance Plasma Resistance\",\"authors\":\"Choluk Oh, O. Kwon, Younghun Bae, Hyejin Shin, Young Min Kwon, Byungjin Cho\",\"doi\":\"10.3365/kjmm.2024.62.5.340\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A ceramic-based plasma etcher window (Lid) requires robust resistance to plasma, especially when exposed to harsh fluorine-based plasma conditions. In this study, a Y<sub>2</sub>O<sub>4</sub> film was deposited using e-beam evaporation with ion beam-assisted deposition (IBAD), and the physical properties of the IBAD-based Y<sub>2</sub>O<sub>4</sub> coating film were thoroughly examined to enhance the mechanical and chemical resistance of the ceramic part, including the Y<sub>2</sub>O<sub>4</sub> film, against etching plasma. The hardness and surface morphology of the IBADbased Y<sub>2</sub>O<sub>4</sub> could be precisely controlled by various deposition processing parameters, such as beam voltage, beam current, and Ar/O2 gas ratio. Following the IBAD deposition of the Y<sub>2</sub>O<sub>4</sub> film, a plasma etching process (Ar/CF<sub>4</sub> mixture gases with 150 W RF power for 60 minutes) was applied to evaluate the plasma resistance of the deposited Y<sub>2</sub>O<sub>4</sub> coating film. The surface morphology characteristics of the Y<sub>2</sub>O<sub>4</sub> films were compared using atomic force microscopy, and their grain size was studied through scanning electron microscopy image analysis. Furthermore, a nanoindenter was used to determine the hardness of the Y<sub>2</sub>O<sub>4</sub> film. These results suggest that optimizing the IBAD coating process requires an in-depth study that fully considers the correlation between deposition processing parameters and physical properties. This optimization can be instrumental for enhancing the durability of the ceramic part.\",\"PeriodicalId\":17894,\"journal\":{\"name\":\"Korean Journal of Metals and Materials\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":1.1000,\"publicationDate\":\"2024-05-05\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Korean Journal of Metals and Materials\",\"FirstCategoryId\":\"88\",\"ListUrlMain\":\"https://doi.org/10.3365/kjmm.2024.62.5.340\",\"RegionNum\":4,\"RegionCategory\":\"材料科学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"MATERIALS SCIENCE, MULTIDISCIPLINARY\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Korean Journal of Metals and Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.3365/kjmm.2024.62.5.340","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
Optimization of Ion Beam-Assisted Deposition Process for Y2O3 Film to Enhance Plasma Resistance
A ceramic-based plasma etcher window (Lid) requires robust resistance to plasma, especially when exposed to harsh fluorine-based plasma conditions. In this study, a Y2O4 film was deposited using e-beam evaporation with ion beam-assisted deposition (IBAD), and the physical properties of the IBAD-based Y2O4 coating film were thoroughly examined to enhance the mechanical and chemical resistance of the ceramic part, including the Y2O4 film, against etching plasma. The hardness and surface morphology of the IBADbased Y2O4 could be precisely controlled by various deposition processing parameters, such as beam voltage, beam current, and Ar/O2 gas ratio. Following the IBAD deposition of the Y2O4 film, a plasma etching process (Ar/CF4 mixture gases with 150 W RF power for 60 minutes) was applied to evaluate the plasma resistance of the deposited Y2O4 coating film. The surface morphology characteristics of the Y2O4 films were compared using atomic force microscopy, and their grain size was studied through scanning electron microscopy image analysis. Furthermore, a nanoindenter was used to determine the hardness of the Y2O4 film. These results suggest that optimizing the IBAD coating process requires an in-depth study that fully considers the correlation between deposition processing parameters and physical properties. This optimization can be instrumental for enhancing the durability of the ceramic part.
期刊介绍:
The Korean Journal of Metals and Materials is a representative Korean-language journal of the Korean Institute of Metals and Materials (KIM); it publishes domestic and foreign academic papers related to metals and materials, in abroad range of fields from metals and materials to nano-materials, biomaterials, functional materials, energy materials, and new materials, and its official ISO designation is Korean J. Met. Mater.