通过聚合物辅助沉积合成调谐 La1-xSrxMnO3 磊晶薄膜中的反铁磁相

IF 3.2 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY Crystal Growth & Design Pub Date : 2024-06-04 DOI:10.1021/acs.cgd.4c00229
Meritxell Toda-Casaban*, Carlos Frontera, Alberto Pomar, Javier Herrero-Martín, José Antonio Alonso, Lluís Balcells, Narcís Mestres and Benjamín Martínez, 
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摘要

利用聚合物辅助沉积法,在 SrTiO3 (100) 基底上制备了 La1-xSrxMnO3 系统的外延薄膜,其成分范围很广(0.5 ≤ x ≤ 0.65)。其主要目的是获得与 x = 0.5 相关的高度稳定的 A 型反铁磁(AF)相。然而,根据体相图,样品的电子和磁性能在 La 与 Sr 的不同替代水平下表现出与预期行为的偏差。利用 X 射线吸收光谱,我们证明了在 x = 0.65 的样品中,Mn3+:Mn4+ 的有效比例实际上达到了 0.5:0.5,这表明存在另一种电荷补偿机制。高氧压退火过程使我们能够证明,为适应外延结构应变而产生的氧空位是部分电荷补偿和观察到的体相图偏差的原因。
本文章由计算机程序翻译,如有差异,请以英文原文为准。

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Tuning of Antiferromagnetic Phase in La1–xSrxMnO3 Epitaxial Thin Films by Polymer-Assisted Deposition Synthesis

Epitaxial thin films of the La1–xSrxMnO3 system, spanning a wide range of compositions (0.5 ≤ x ≤ 0.65), have been prepared, using the polymer-assisted deposition method, on SrTiO3 (100) substrates. The primary objective was to achieve the highly stable A-type antiferromagnetic (AF) phase associated with x = 0.5. However, the electronic and magnetic properties of the samples, with different substitution levels of La with Sr, exhibit deviations from the anticipated behavior according to the bulk phase diagram. Employing X-ray absorption spectroscopy, we demonstrate that the effective 0.5:0.5 ratio of Mn3+:Mn4+ is actually attained in the sample with x = 0.65, suggesting the presence of an alternative charge compensation mechanism. High oxygen pressure annealing processes allow us to demonstrate that oxygen vacancies, generated to accommodate the epitaxial structural strain, are responsible for the partial charge compensation and the observed deviations from the bulk phase diagram.

Epitaxial thin films of the La1−xSrxMnO3 system (0.5 ≤ x ≤ 0.65) have been prepared by PAD to achieve the A-type antiferromagnetic (AF) phase (x = 0.5). However, the samples show deviations from the bulk phase diagram, and this AF phase is found for x = 0.65, according to XAS. The presence of oxygen vacancies can justify these results.

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来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
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