聚合物链聚合诱导的 H 聚合物和 J 聚合物 P3HT 电门控

IF 1.1 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Korean Journal of Metals and Materials Pub Date : 2024-06-05 DOI:10.3365/kjmm.2024.62.6.455
Byoungnam Park
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引用次数: 0

摘要

这项研究探讨了聚合如何影响平面异质结聚(3-己基噻吩)(P3HT)/二氧化硅(SiO2)和聚(3-己基噻吩)/氧化锌(ZnO)纳米晶(NC)界面的电气行为。H 型和 J 型聚合体的形成导致不同的分子排序和堆积结构,表现为阈值电压偏移(电门控)以及吸收和发光特性的变化。超声辐照(超声处理)会显著改变 P3HT 的分子排列,有利于 H 型聚集体的形成,而不是通常形成的 J 型聚集体。在原始的 P3HT 中,J-聚合体有助于有效的激子运动和电能产生,从而产生更高的光电流,而超声处理后的 P3HT 则主要形成 H-聚合体。基于超声 P3HT 的场效应晶体管(FET)显示出更正的阈值电压和更高的迁移率,这表明即使在没有外加电压的情况下,也存在更多的移动电荷载流子。在与 ZnO NC 的界面中,原始 P3HT 在光照下的阈值电压会发生相当大的变化,这归因于电子捕获。相反,与 ZnO NC 相连接的超声 P3HT 则减少了电子捕获,阈值电压的变化也很小。这项研究强调了 P3HT 中的聚合体类型(H 或 J)是如何在很大程度上决定光诱导电门控的。超声辐照(超声处理)可通过提高结晶度来增强迁移率,但与棱柱形 P3HT 中的 J 聚合物相比,H 聚合物的光电流效率会降低。
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Polymer-Chain Aggregation-induced Electrical Gating at the H- and J-aggregate P3HT
This research explores how aggregation influences the electrical behavior at both the planar - heterojunction poly(3-hexylthiophene) (P3HT)/SiO2 and P3HT/ZnO nanocrystal (NC) interfaces. The formation of H- and J-type aggregates leads to distinct molecular ordering and packing structures, manifesting as changes in threshold voltage shifts (electrical gating) as well as absorption and luminescence properties. Ultrasound irradiation (sonication) significantly alters the molecular arrangement in P3HT, favoring the formation of H-aggregates over the typically formed J-aggregates. In pristine P3HT, J-aggregates facilitate efficient exciton movement and electrical generation, resulting in higher photocurrents compared to sonicated-P3HT, which predominantly forms H-aggregates. Field-effect transistors (FETs) based on sonicated P3HT exhibit a more positive threshold voltage and increased mobility, indicating the presence of more mobile charge carriers, even in the absence of an applied voltage. In interfaces with ZnO NC, pristine P3HT demonstrates a considerable shift in threshold voltage under illumination, attributed to electron trapping. Conversely, sonicated P3HT interfaced with ZnO NC shows less electron trapping and minimal change in threshold voltage. This study underscores how the type of aggregate (H or J) in P3HT significantly dictates light-induced electrical gating. Ultrasound irradiation (sonication), while enhancing mobility by improving crystallinity, leads to a decrease in photocurrent efficiency in H-aggregates compared to the J-aggregates present in pristine-P3HT.
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来源期刊
Korean Journal of Metals and Materials
Korean Journal of Metals and Materials MATERIALS SCIENCE, MULTIDISCIPLINARY-METALLURGY & METALLURGICAL ENGINEERING
CiteScore
1.80
自引率
58.30%
发文量
100
审稿时长
4-8 weeks
期刊介绍: The Korean Journal of Metals and Materials is a representative Korean-language journal of the Korean Institute of Metals and Materials (KIM); it publishes domestic and foreign academic papers related to metals and materials, in abroad range of fields from metals and materials to nano-materials, biomaterials, functional materials, energy materials, and new materials, and its official ISO designation is Korean J. Met. Mater.
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