{"title":"基于锥形偏转器的变轴透镜系统比较研究","authors":"Qingmao Zhang, Qirui Wang, Delong Chen, Junbiao Liu, Yanjun Zhang, Quantong Li, Zhuming Liu","doi":"10.1116/6.0003605","DOIUrl":null,"url":null,"abstract":"A variable axis lens (VAL) concept has been demonstrated an effective method to reduce aberrations of electron beam machines and has been explored to several configurations. To implement the advantages of VAL fully, it is desirable to make the axial potential distribution of the objective lens match the deflection functions of deflectors well. To our knowledge, the electrostatic deflectors applied in electron-optical systems based on VAL concept are all constructed with a “cylindrical” shape. However, when a magnetic objective lens in the VAL configurations is constructed with different radii of upper and lower pole pieces, there is a mismatch between the asymmetric lens and cylindrical deflectors, which would lead to a significant increase in aberrations. With this in mind, we have developed tapered deflectors to address the foregoing problem. A comparative study on variable axis lens systems based on conventional cylindrical deflectors and the proposed tapered ones is undertaken. Simulation results demonstrate the validity and effectiveness of the proposed VALs to reduce aberrations and an electron beam landing angle.","PeriodicalId":282302,"journal":{"name":"Journal of Vacuum Science & Technology B","volume":"33 12","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2024-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Comparative study on variable axis lens systems based on tapered deflectors\",\"authors\":\"Qingmao Zhang, Qirui Wang, Delong Chen, Junbiao Liu, Yanjun Zhang, Quantong Li, Zhuming Liu\",\"doi\":\"10.1116/6.0003605\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A variable axis lens (VAL) concept has been demonstrated an effective method to reduce aberrations of electron beam machines and has been explored to several configurations. To implement the advantages of VAL fully, it is desirable to make the axial potential distribution of the objective lens match the deflection functions of deflectors well. To our knowledge, the electrostatic deflectors applied in electron-optical systems based on VAL concept are all constructed with a “cylindrical” shape. However, when a magnetic objective lens in the VAL configurations is constructed with different radii of upper and lower pole pieces, there is a mismatch between the asymmetric lens and cylindrical deflectors, which would lead to a significant increase in aberrations. With this in mind, we have developed tapered deflectors to address the foregoing problem. A comparative study on variable axis lens systems based on conventional cylindrical deflectors and the proposed tapered ones is undertaken. Simulation results demonstrate the validity and effectiveness of the proposed VALs to reduce aberrations and an electron beam landing angle.\",\"PeriodicalId\":282302,\"journal\":{\"name\":\"Journal of Vacuum Science & Technology B\",\"volume\":\"33 12\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2024-06-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Vacuum Science & Technology B\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1116/6.0003605\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Vacuum Science & Technology B","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1116/6.0003605","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
摘要
可变轴透镜(VAL)概念已被证明是减少电子束机器像差的有效方法,并已被应用于多种配置中。为了充分发挥 VAL 的优势,最好能使物镜的轴向电势分布与偏转器的偏转功能相匹配。据我们所知,基于 VAL 概念应用于电子光学系统的静电偏转器都是 "圆柱形 "的。然而,当 VAL 配置中的磁性物镜的上下极片半径不同时,不对称透镜和圆柱形偏转器之间就会出现不匹配,从而导致像差显著增加。有鉴于此,我们开发了锥形偏转器来解决上述问题。我们对基于传统圆柱形偏转器和所提出的锥形偏转器的变轴透镜系统进行了比较研究。仿真结果证明了所提出的变轴透镜在减少像差和电子束着陆角方面的有效性和有效性。
Comparative study on variable axis lens systems based on tapered deflectors
A variable axis lens (VAL) concept has been demonstrated an effective method to reduce aberrations of electron beam machines and has been explored to several configurations. To implement the advantages of VAL fully, it is desirable to make the axial potential distribution of the objective lens match the deflection functions of deflectors well. To our knowledge, the electrostatic deflectors applied in electron-optical systems based on VAL concept are all constructed with a “cylindrical” shape. However, when a magnetic objective lens in the VAL configurations is constructed with different radii of upper and lower pole pieces, there is a mismatch between the asymmetric lens and cylindrical deflectors, which would lead to a significant increase in aberrations. With this in mind, we have developed tapered deflectors to address the foregoing problem. A comparative study on variable axis lens systems based on conventional cylindrical deflectors and the proposed tapered ones is undertaken. Simulation results demonstrate the validity and effectiveness of the proposed VALs to reduce aberrations and an electron beam landing angle.