通过配位σ-供体 Ni(0) 配体稳定的二氢硅烷基离子的氢化反应

Tsuyoshi Kato, Shintaro Takahashi, A. Baceiredo, N. Saffon‐Merceron
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引用次数: 0

摘要

研究人员对通过配位σ-供体镍(0)片段而稳定的二氢硅烷基离子的氢化反应进行了研究。这种具有两个反应位点(二氢硅烷基和 Ni(0) 中心)的配合物很容易通过选择性单氢硅烷化反应与二苯基乙炔发生反应,生成相应的 Ni(0) 稳定化(氢)(乙烯基)硅烷基离子。在乙烯的情况下,消耗三当量的烯烃,得到阳离子 Ni(II)- 复合物,该复合物具有一个 Bu-Si+-NiII-Et 分子和一个 NHC 支持的硅原子。DFT 计算表明,在 NHC 配体的帮助下,氢硅烷化反应是通过经典(Chalk-Harrod 型)机理进行的,NHC 配体根据稳定要求在 Si 和 Ni 中心之间移动。
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Hydrosilylation Reactions with a Dihydrosilylium Ion Stabilized by Coordination of a σ‐Donating Ni(0) Ligand
The hydrosilylation reactions of dihydrosilylium ion, stabilized by coordination of a σ‐donating Ni(0) fragment, has been investigated. This complex with two reactive sites, dihydrosilylium and Ni(0) centers, readily reacts with diphenylacetylene via a selective mono‐hydrosilylation reaction to afford the corresponding Ni(0)‐stabilized (hydro)(vinyl)silylium ion. In the case of ethylene, three equivalents of olefin are consumed to give a cationic Ni(II)‐complex featuring a Bu‐Si+‐NiII‐Et moiety with a NHC‐supported Si atom. DFT calculations indicate that the hydrosilylation proceeds by a classical (Chalk‐Harrod type) mechanism with the assistance of NHC ligand moving between Si and Ni centers according to their stabilization requirements.
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