空间群为 R3 的斜方氧化铪基本特性的第一原理计算

Alexander Reznik, Vyacheslav Konstantinov, E. Ganykina, Askar Rezvanov
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摘要

利用量子化学计算研究了空间群为 R3 的斜方氧化铪(r-HfO2)的结构、机械和电物理特性,以及空间群为 Pca21 的 HfO2、ZrO2 和 Hf0.5Zr0.5O2 的特性。2θ r-HfO2 的特征衍射峰接近于四方(t-HfO2)和正方(f-HfO2)氧化铪的特征衍射峰。体积模量值为 231 GPa,大于正方体结构。拉曼光谱的高强度峰值为 670 和 540 cm-1。带隙宽度为 5.8 eV,介电常数的平均值为 35.34,高于正方体氧化铪。
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First‐Principles Calculation of Basic Properties of Rhombohedral Hafnium Oxide with Space Group R3
Structural, mechanical, and electrophysical properties of rhombohedral hafnium oxide (r‐HfO2) with space group R3, as well as properties of HfO2, ZrO2, and Hf0.5Zr0.5O2 with space group Pca21 are studied using quantum chemical calculations. The characteristic diffraction peak of 2θ r‐HfO2 is close to the characteristic diffraction peaks of tetragonal (t‐HfO2) and orthorhombic (f‐HfO2) hafnium oxide. The value of bulk modulus is 231 GPa, which is larger than one of the orthorhombic structures. The values of high intensity peaks of Raman spectrum are 670 and 540 cm−1. The bandgap width is 5.8 eV and the average value of dielectric constant is 35.34, which is higher than one of orthorhombic hafnium oxide.
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