Interface trap induced RF and low frequency noise analysis under temperature variations of a hetero-stacked source L-gate TFET

This brief exclusively demonstrates a comprehensive analysis of the adverse impact of interface trap charge (ITC) under the influence of temperature variation on a hetero-stacked (HS) source L-gate tunnel field effect transistor (TFET) having SiGe pocket. An investigation of both static and RF characteristics has been carried out. It appears that ITCs situated at the Silicon (Si)/oxide interface fluctuates the flat-band voltage to alter the various analog/RF parameter characteristics. Uniform ITCs are seen to be less susceptible to degradation in device characteristics. The low frequency noise (LFN) analysis has also been investigated considering the impact of different trap distribution (Uniform and Gaussian) and densities which are compared thereafter. Besides, the temperature dependent LFN has been studied under influence of different distributed ITCs which is rarely explored yet. Moreover, a comparative analysis has been done on the device behaviour and LFN characteristics of HS L-gate TFET structures with and without SiGe pocket. The structure with SiGe pocket is found to be insusceptible to noise effects.