钴薄膜静磁特性的实验研究

IF 1.6 4区物理与天体物理 Q3 PHYSICS, CONDENSED MATTER The European Physical Journal B Pub Date : 2024-06-25 DOI:10.1140/epjb/s10051-024-00729-w

A. Kharmouche

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摘要

在 10-7 毫巴的压力下，采用热加热工艺在单晶硅衬底上沉积钴薄膜。入射光束以正常入射方式照射基底。薄膜厚度从 50 纳米到 400 纳米不等。为了研究静磁特性，使用交变梯度磁场磁力计装置进行磁滞回线。使用 Veeco 3100 仪器，通过磁力显微镜（MFM）技术对零磁场磁性结构进行了研究。磁力显微镜图像显示了清晰的条纹图案，主要是最厚的薄膜，推断出磁晶各向异性的主导地位。易磁化轴位于薄膜平面内，较厚薄膜的易磁化轴在平面外有少量分量。矫顽力随厚度的变化遵循 t-n 奈尔定律，这是布洛赫畴壁运动的特征。此外，研究还发现矫顽力明显取决于薄膜的表面粗糙度。

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An experimental study of the static magnetic properties of Co thin films

Thermal heating process has been used, under a pressure of 10⁻⁷ mbar, to deposit thin films of cobalt onto monocrystalline silicon substrate. The incident beam strikes the substrates under normal incidence. The thickness ranges from 50 to 400 nm. To investigate the static magnetic properties, the hysteresis loops are performed by means of alternating gradient field magnetometer device. The zero-field magnetic structure has been investigated by magnetic force microscopy (MFM) technique, using a Veeco 3100 apparatus. MFM images reveal well-defined stripe patterns, mainly for the thickest films, which infer the dominance of the magnetocrystalline anisotropy. The easy magnetization axis lies within the plane of the film with a small component out-of-the plane for the thicker films. Coercivity evolution versus thickness follows a t⁻ⁿ Néel law, characteristic of Bloch domain wall motion. In addition, it was found that coercivity depends plainly on the surface roughness of the films.