热效应对用于纳米器件存储的磁阶梯纳米线畴壁稳定性的影响

Nanomaterials Pub Date : 2024-07-15 DOI:10.3390/nano14141202
M. Al Bahri, S. Al-Kamiyani
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引用次数: 0

摘要

未来,具有高存储容量和快速读写速度的 DW 存储器将取代传统存储存储器。DW 存储器的唯一故障来自针脚部位的 DW 热波动。本研究通过计算研究了有助于控制引脚处 DW 热稳定性的参数。建议设计一种新方案,使用一定深度 (d) 和长度 (λ) 的阶梯区域。研究表明,DW 热稳定性高度依赖于针刺区的几何形状(d 和 λ)、磁特性(如饱和磁化(Ms)和磁各向异性能(Ku))以及纳米线的尺寸。对于特定的 d 和 λ 值,DW 在 500 K 以上的温度下仍能保持稳定,这有利于存储器的应用。通过将纳米线厚度减小到小于 10 纳米,还可以获得更高的 DW 热稳定性,从而使 DW 存储器在低于 800 K 的温度下保持稳定。
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Thermal Effects on Domain Wall Stability at Magnetic Stepped Nanowire for Nanodevices Storage
In the future, DW memory will replace conventional storage memories with high storage capacity and fast read/write speeds. The only failure in DW memory arises from DW thermal fluctuations at pinning sites. This work examines, through calculations, the parameters that might help control DW thermal stability at the pinning sites. It is proposed to design a new scheme using a stepped area of a certain depth (d) and length (λ). The study reveals that DW thermal stability is highly dependent on the geometry of the pinning area (d and λ), magnetic properties such as saturation magnetization (Ms) and magnetic anisotropy energy (Ku), and the dimensions of the nanowires. For certain values of d and λ, DWs remain stable at temperatures over 500 K, which is beneficial for memory applications. Higher DW thermal stability is also achieved by decreasing nanowire thickness to less than 10 nm, making DW memories stable below 800 K. Finally, our results help to construct DW memory nanodevices with nanodimensions less than a 40 nm width and less than a 10 nm thickness with high DW thermal stability.
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